Workshop I: Plasma Diagnostics

FOCUS · BM21 · ID: 13724





Presentations

  • ORAL · Invited

    Presenters

    • Chinwook Chung

      • Hanyang University
      • Hanyang Univ.
      • Hanyang Univ
      • Hanyang univ.
      • Hanyang university

    Authors

    • Chinwook Chung

      • Hanyang University
      • Hanyang Univ.
      • Hanyang Univ
      • Hanyang univ.
      • Hanyang university
    • Hyundong Eo

      • Hanyang University
    • Moo-Young Lee

      • Hanyang University
      • Hanyang university
    • Ho Won Lee

      • Hanyang University

    View abstract →

  • ORAL · Invited

    Presenters

    • Jean-Pierre van Helden

      • Leibniz Institute for Plasma Science and Technology (INP)

    Authors

    • Jean-Pierre van Helden

      • Leibniz Institute for Plasma Science and Technology (INP)
    • Sarah Klose

      • Leibniz Institute for Plasma Science and Technology (INP)
    • Ibrahim Sadiek

      • Leibniz Institute for Plasma Science and Technology (INP)
    • Norbert Lang

      • Leibniz Institute for Plasma Science and Technology (INP)

    View abstract →

  • ORAL · Invited

    Publication: H. Zhong, C. Yan, C.C. Teng, T.Y. Chen, G. Wysocki, Y. Ju, Kinetic studies of excited singlet oxygen atom O (1D) reactions with ethanol, International Journal of Chemical Kinetics 53 (2021) 688-701.

    H. Zhong, X. Mao, A.C. Rousso, C.L. Patrick, C. Yan, W. Xu, Q. Chen, G. Wysocki, Y. Ju, Kinetic studies of plasma assisted n-dodecane/O2/N2 pyrolysis and oxidation in a nanosecond-pulsed discharge, Proceedings of Combustion Insittute 38 (2021).

    Presenters

    • Yiguang Ju

      • Princeton University

    Authors

    • Yiguang Ju

      • Princeton University
    • Hongtao Zhong

      • Princeton University
    • Chao Yan

      • Princeton University

    View abstract →

  • ORAL · Invited

    Publication: [1] Appl. Phys. Lett., 83 4725 (2003). Rev. Sci. Instrum. 75 2706 (2004), Metrologia 42 110 (2005).
    [2] Appl. Phys. Lett., 96, 081502 (2010). Rev. Sci. Instrum. 83, 013510 (2012).
    [3] Appl. Phys. Lett. 91, 201502 (2007).
    [4] Hyo-Chang Lee, Jung Hyung Kim, Dae, Daejin Seong, Hee Jung Yeom, PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS, WAFER-TYPE PLASMA DIAGNOSIS APPARATUS IN WHICH PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS IS BURIED, AND ELECTROSTATIC CHUCK IN WHICH PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS IS BURIED, Korea Patent. 10-2020-0095022 , PCT Patent. PCT/KR2019/004500, US Patent. 17050373, China Patent. 201980028803.9, EU Patent. 19912976.8, Japan Patent. 52002369478, Plasma Sources Sci. Technol. 28 015004 (2019), Plasma Sources Sci. Technol. 29 035016 (2020), Plasma Sources Sci. Technol. in-press (https://doi.org/10.1088/1361-6595/abef1a)
    [5] Plasma Sources Sci. Technol. 29 035016 (2020).
    [6] Hyo-Chang Lee, Jung Hyung Kim, Dae, Hee Jung Yeom, Device for measuring plasma ion density and Apparatus for plasma diagnostics using the same, Korea Patent. 1020210038119, US Patent. 17222937, China Patent. 2021110374496.9, EU Patent. EP21167098.9, Japan Patent. 2021-062613

    Presenters

    • Hyo-Chang Lee

      • Korea Research Institute of Standards and Science
      • Korea Research Institute of Standards and Science (KRISS)
      • Korea Research Inst of Standards and Sci

    Authors

    • Hyo-Chang Lee

      • Korea Research Institute of Standards and Science
      • Korea Research Institute of Standards and Science (KRISS)
      • Korea Research Inst of Standards and Sci
    • Jung Hyung Kim

      • Korea Research Institute of Standards and Science
      • Korea Research Institute of Standard and Science (KRISS)
      • Korea Research Institute of Standards and Science (KRISS)
      • Korea Research Institute of Standard and Science

    View abstract →