Focus Session: Beyond Graphene - Devices I

FOCUS · W2 ·

Presentations

  • ORAL

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    Authors

    • Nihar Pradhan*

      • National High Magnetic Field Laboratory, Tallahassee, Florida, USA
      • NHMFL, Florida State Univ

    • Zhengguang Lu

      • National High Magnetic Field Laboratory, Tallahassee, Florida, USA
      • NHMFL, Florida State Univ
      • National High Magnetic Field Lab, Florida State University, 1800 E. Paul Dirac Dr. Tallahassee, FL 32310

    • Daniel Rhodes

      • National High Magnetic Field Laboratory, Tallahassee, Florida, USA

    • Mauricio Terrones

      • Department of Physics, Pennsylvania State University, University Park, PA, USA

    • Dmitry Smirnov

      • National High Magnetic Field Laboratory, Tallahassee, Florida, USA

    • Luis Balicas

      • National High Magnetic Field Laboratory, Tallahassee, Florida, USA
      • National High Magnetic Field Lab
      • NHMFL, Florida State Univ.
      • NHMFL, Florida State Univ

    View abstract →

  • ORAL

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    Authors

    • Henry Yu

      • Materials Science and NanoEngineering, Rice University

    • Alex Kutana

      • Materials Science and NanoEngineering, Rice University
      • Department of Materials Science and NanoEngineering, Rice University, Houston, TX

    • Boris Yakobson

      • Rice University, Houston, TX
      • Materials Science and NanoEngineering, Rice University
      • Department of Materials Science and NanoEngineering, Rice University, Houston, TX
      • Department of Materials Science and NanoEngineering, Dept. of Chemistry, and Smalley Institute for Nanoscale Science and Technology, Rice University
      • Department of Materials Science and Nanoengineering, and the Smalley Institute for Nanoscale Science
      • Rice University

    View abstract →

  • ORAL

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    Authors

    • Hui Yuan

      • Dept of Electrical and Computer Eng, George Mason University, Fairfax, VA

    • Guangjun Cheng

      • PML, NIST
      • Semiconductor and Dimensional Metrology Div, NIST, Gaithersburg, MD

    • Angela Hight Walker

      • National Institute of Standards and Technology
      • National Institute of Standards and Technology (NIST)
      • Semiconductor and Dimensional Metrology Div, NIST, Gaithersburg, MD
      • National Institute of Standards and Technology, Gaithersburg, MD 20899
      • NIST

    • Lin You

      • Semiconductor and Dimensional Metrology Div, NIST, Gaithersburg, MD
      • Semiconductor and Dimensional Metrology Division, National Institute of Standards and Technology

    • Joseph J. Kopanski

      • Semiconductor and Dimensional Metrology Div, NIST, Gaithersburg, MD

    • Qiliang Li

      • Dept of Electrical and Computer Eng, George Mason University, Fairfax, VA

    • Curt A. Richter

      • Semiconductor and Dimensional Metrology Div, NIST, Gaithersburg, MD

    View abstract →

  • ORAL

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    Authors

    • Jianhao Chen

      • International Center for Quantum Materials, School of Physics, Peking University; Collaborative Innovation Center of Quantum Matter, Beijing, China

    • Xin Liu

      • International Center for Quantum Materials, School of Physics, Peking University; Collaborative Innovation Center of Quantum Matter, Beijing, China

    • Shibing Tian

      • International Center for Quantum Materials, School of Physics, Peking University; Collaborative Innovation Center of Quantum Matter, Beijing, China

    • Chenglong Zhang

      • International Center for Quantum Materials, School of Physics, Peking University; Collaborative Innovation Center of Quantum Matter, Beijing, China

    • Shuang Jia

      • International Center for Quantum Materials, School of Physics, Peking University; Collaborative Innovation Center of Quantum Matter, Beijing, China

    View abstract →