Focus Session: Beyond Graphene - Phosphorene III

FOCUS · L1 ·

Presentations

  • ORAL

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    Authors

    • Joon-Seok Kim

      • The University of Texas at Austin

    • Yingnan Liu

      • The University of Texas at Austin

    • Weinan Zhu

      • The University of Texas at Austin

    • Seohee Kim

      • The University of Texas at Austin

    • Di Wu

      • The University of Texas at Austin

    • Li Tao

      • The University of Texas at Austin

    • Ananth Dodabalapur

      • The University of Texas at Austin

    • Keji Lai

      • The University of Texas at Austin

    • Deji Akinwande

      • Microelectronics Research Center, The University of Texas at Austin, Texas 78758, USA
      • The University of Texas at Austin
      • Univ of Texas, Austin
      • Department of Electrical and Computer Engineering, The University of Texas at Austin, TX 78712
      • UT Austin

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  • ORAL

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    Authors

    • Spencer Wells

      • Northwestern University

    • Joshua Wood

      • Northwestern University

    • Deep Jariwala

      • Northwestern University

    • Kan-Sheng Chen

      • Northwestern University

    • EunKyung Cho

      • Northwestern University

    • Vinod Sangwan

      • Northwestern University

    • Xiaolong Liu

      • Northwestern University

    • Lincoln Lauhon

      • Northwestern University

    • Tobin Marks

      • Northwestern University

    • Mark Hersam

      • Department of Materials Science and Engineering, Northwestern University
      • Northwestern University

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  • ORAL

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    Authors

    • Li Tao

      • Microelectronics Research Center, The University of Texas at Austin, Texas 78758, USA

    • Eugenio Cinquanta

      • Laboratorio MDM, IMM-CNR, via C. Olivetti 2, Agrate Brianza, I-20864, Italy

    • Carlo Grazianetti

      • Laboratorio MDM, IMM-CNR, via C. Olivetti 2, Agrate Brianza, I-20864, Italy

    • Alessandro Molle

      • Laboratorio MDM, IMM-CNR, via C. Olivetti 2, Agrate Brianza, I-20864, Italy
      • CNR-IMM, Laboratorio MDM

    • Deji Akinwande

      • Microelectronics Research Center, The University of Texas at Austin, Texas 78758, USA
      • The University of Texas at Austin
      • Univ of Texas, Austin
      • Department of Electrical and Computer Engineering, The University of Texas at Austin, TX 78712
      • UT Austin

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  • ORAL

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    Authors

    • Han Wang

      • Ming Hsieh Dept. EE, USC

    • Xiaomu Wang

      • Dept. EE, Yale
      • Yale Univ
      • Yale University

    • Fengnian Xia

      • Dept. EE, Yale

    • Luhao Wang

      • Ming Hsieh Dept. EE, USC

    • Hao Jiang

      • Dept. ECE, U Mass

    • Qiangfei Xia

      • Dept. ECE, U Mass

    • Mattew L. Chin

      • Sens \& Elec. Dev. Directorate, US ARL

    • Madan Dubey

      • Sens \& Elec. Dev. Directorate, US ARL

    • Shu-jen Han

      • IBM T.J. Wason Cent.

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  • ORAL

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    Authors

    • Ahmet Avsar

      • Graphene Research Center, National University of Singapore

    • Ivan Jesus Vera-Marun

      • Graphene Research Center, National University of Singapore;Zernike Institute for Advanced Materials, University of Groningen, The Netherlands

    • Jun You Tan

      • Graphene Research Center, National University of Singapore

    • Kenji Watanabe

      • National Institute for Materials Science, Japan

    • Takashi Taniguchi

      • National Institute for Materials Science, Japan

    • Antonio Castro Neto

      • Graphene Research Center, National University of Singapore
      • National University of Singapore

    • Barbaros \"Ozyilmaz

      • Graphene Research Center, National University of Singapore

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  • ORAL

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    Authors

    • Likai Li

      • Fudan University

    • Guojun Ye

      • University of Science and Technology of China

    • Vy Tran

      • Washington University in St. Louis, St. Louis

    • Guorui Chen

      • Fudan University

    • Huichao Wang

      • Peking University

    • Jian Wang

      • Peking University

    • Kenji Watanabe

      • National Institute for Materials Science

    • Takashi Taniguchi

      • National Institute for Materials Science

    • Li Yang

      • Washington University in St. Louis, St. Louis

    • Xianhui Chen

      • University of Science and Technology of China

    • Yuanbo Zhang

      • Fudan University

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  • ORAL

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    Authors

    • Matheus Lima

      • University of S\~ao Paulo
      • Instituto de F\'isica, Universidade de S\~ao Paulo, CP 66318, 05315-970, S\~ao Paulo, SP, Brazil

    • Adalberto Fazzio

      • Sao Paulo University
      • Universidade de S\~ao Paulo
      • University of S\~ao Paulo
      • Instituto de F\'isica, Universidade de S\~ao Paulo, CP 66318, 05315-970, S\~ao Paulo, SP, Brazil
      • Universidade de Sao Paulo

    • Antonio Jose Roque da Silva

      • Brazilian Synchrotron Light Laboratory (LNLS)
      • Laborat\'orio Nacional de Luz S\'incrotron - LNLS
      • University of S\~ao Paulo
      • Instituto de F\'isica, Universidade de S\~ao Paulo, CP 66318, 05315-970, S\~ao Paulo, SP, Brazil
      • Universidade de Sao Paulo/Laboratorio Nacional de Luz Sincrotron

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  • ORAL

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    Authors

    • Seung Su Baik

      • Center for Computational Studies of Advanced Electronic Material Properties (CCSAEMP) and Department of Physics, Yonsei University, Korea

    • Hyoung Joon Choi

      • Center for Computational Studies of Advanced Electronic Material Properties, Yonsei University
      • Department of Physics, IPAP, and Center for Computational Studies of Advanced Electronic Material Properties, Yonsei University, Seoul, Korea
      • Center for Computational Studies of Advanced Electronic Material Properties (CCSAEMP) and Department of Physics, Yonsei University, Korea

    View abstract →