Focus Session: Graphene: Field-Effect Devices
FOCUS · Y21 ·
Presentations
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FET device with suspended graphene
ORAL
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Authors
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Jian Ming Lu
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Zikang Tang
- The Hong Kong University of Science and Technology
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Graphene field-effect transistors built with graphene-oxide gate dielectric
ORAL
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Authors
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Brian Standley
- California Institute of Technology
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Anthony Mendez
- California Institute of Technology
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Emma Schmidgall
- Imperial College London
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Marc Bockrath
- University of California Riverside
- University of California, Riverside
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High mobility monolayer graphene over a 150mm substrate
ORAL
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Authors
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Jinseong Heo
- Samsung Advanced Institute of Technology
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Yun Sung Woo
- Samsung Advanced Institute of Technology
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David H. Seo
- Samsung Advanced Institute of Technology
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Hyun-Jong Chung
- Samsung Advanced Institute of Technology
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Sunae Seo
- Samsung Advanced Institute of Technology
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Charge transport in graphene field effect transistors with ferroelectric gating
COFFEE_KLATCH · Invited
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Authors
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Barbaros \"Ozyilmaz
- NanoCore and Physics Department, National University of Singapore, Singapore
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Novel Graphene Devices by Precision Transfer Method
ORAL
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Authors
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Cory Dean
- Columbia University
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Inanc Meric
- Columbia University
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Andrea Young
- Columbia University
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Changgu Lee
- Columbia University
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Natalia Baklitskaya
- Columbia University
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Philip Kim
- Columbia University
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Jim Hone
- Columbia University
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Ken Shepard
- Columbia University
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Capacitance of graphenes
ORAL
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Authors
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Andrea Young
- Columbia University
- Columbia
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Cory Dean
- Columbia University
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Inanc Meric
- Columbia University
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Jim Hone
- Columbia University
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Ken Shepard
- Columbia University
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Philip Kim
- Columbia University
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Temperature-Dependent Subthreshold Characteristics in Graphene Nanoribbon Tunneling Transistors
ORAL
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Authors
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Youngki Yoon
- University of California, Berkeley
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Sayeef Salahuddin
- University of California, Berkeley
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Effect of SiO$_{2}$ surface treatment on graphene transistors fabricated on Si:SiO$_{2}$ substrates using a lithography free process
ORAL
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Authors
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Prasoon Joshi
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Vijay Toutam
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Srinivas Tadigadapa
- Department Of Electrical Engineering, Penn State University
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Adam Neal
- Department Of Electrical Engineering, Purdue University
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Humberto Gutierrez
- Physics Department, Penn State University
- Department Of Physics, Penn State University
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Graphite based Schottky diodes formed semiconducting substrates
ORAL
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Authors
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T. Schumann
- University of Florida
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Sefaattin Tongay
- University of Florida
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Arthur Hebard
- University of Florida
- Department of physics, University of Florida
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Local Ambipolar Graphene Field Effect Transistors via Metal Side Gates
ORAL
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Authors
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Jifa Tian
- Institute of Physics, Chinese Academy of Sciences
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Luis Jauregui
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Gabriel Lopez
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Helin Cao
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Yong Chen
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Optimization of Graphene Field-Effect Transistors for RF Applications
ORAL
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Authors
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Hsin-Ying Chiu
- IBM T. J. Watson Research Center
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Yu-Ming Lin
- IBM T. J. Watson Research Center
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Keith A. Jenkins
- IBM T. J. Watson Research Center
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Damon Farmer
- IBM T. J. Watson Research Center
- IBM Thomas J. Watson Research Center
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Alberto Valdes-Garcia
- IBM T. J. Watson Research Center
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Phaedon Avouris
- IBM T. J. Watson Research Center
- IBM T.J. Watson Research Center
- IBM - Watson
- IBM Thomas J. Watson Research Center
- IBM Thomas J. Watson Research Center, Yorktown Heights, NY 10598, USA
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Heteroepitaxial Graphene on a Si Substrate Field-Effect Transistor
ORAL
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Authors
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Roman Olac-vaw
- Electrical Engineering Department, University at Buffalo, Buffalo, NY USA
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Hyun Chul Kang
- Research Institute of Electrical Communication, Tohoku University, Sendai, Japan
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Tsuneyoshi Komori
- Research Institute of Electrical Communication, Tohoku University, Sendai, Japan
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Tatayuki Watanabe
- Research Institute of Electrical Communication, Tohoku University, Sendai, Japan
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Hiromi Karasawa
- Research Institute of Electrical Communication, Tohoku University, Sendai, Japan
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Yu Miyamoto
- Research Institute of Electrical Communication, Tohoku University, Sendai, Japan
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Hiroyuki Handa
- Research Institute of Electrical Communication, Tohoku University, Sendai, Japan
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Hirokazu Fukidome
- Research Institute of Electrical Communication, Tohoku University, Sendai, Japan
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Tetsuya Suemitsu
- JST-CREST, Japan Science and Technology Agency, Tokyo, Japan
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Maki Suemitsu
- JST-CREST, Japan Science and Technology Agency, Tokyo, Japan
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Vladimir Mitin
- Electrical Engineering Department, University at Buffalo, Buffalo, NY USA
- Electrical Engineering Department, University at Buffalo
- University at Buffalo
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Taiichi Otsuji
- JST-CREST, Japan Science and Technology Agency, Tokyo, Japan
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Scanning Tunneling Microscopic Studies of Dielectric Gate Materials on Graphene
ORAL
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Authors
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M.L. Teague
- Dept. of Physics, Caltech, Pasadena, CA 91125
- Phys. Dept., Caltech, Pasadena, CA 91125
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T.-P. Wu
- Dept. of Physics, Caltech, Pasadena, CA 91125
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M.W. Bockrath
- Dept. of Physics, Caltech, Pasadena, CA 91125
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N.-C. Yeh
- Dept. of Physics, Caltech, Pasadena, CA 91125
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C.N. Lau
- Dept. of Physics, UC Riverside, Riverside, CA 92521
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