Dielectrics
ORAL · N20 ·
Presentations
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The mechanism of Fermi level pinning/unpinning at high k Oxide/GaAs interface
ORAL
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Authors
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M.L. Huang
- Dep. of Materials Science and Engineering, National Tsing Hua Uni., Hsinchu, Taiwan
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W.C. Lee
- Dept. of Materials science and Engineering, National Tsing Hua Uni., Taiwan
- Dept. of Materials Science and Engineering, National Tsing Hua Univ., Taiwan
- Dep. of Materials Science and Engineering, National Tsing Hua Uni., Hsinchu, Taiwan
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P. Chang
- Dep. of Materials Science and Engineering, National Tsing Hua Uni., Hsinchu, Taiwan
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T.D. Lin
- Dept. of Materials Science and Engineering, National Tsing Hua Univ., Taiwan
- Dep. of Materials Science and Engineering, National Tsing Hua Uni., Hsinchu, Taiwan
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Y.J. Lee
- Dept. of Materials Science and Engineering, National Tsing Hua Univ., Taiwan
- Dep. of Materials Science and Engineering, National Tsing Hua Uni., Hsinchu, Taiwan
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M. Hong
- Dept. of Materials science and Engineering, National Tsing Hua Uni., Taiwan
- Dept. of Materials Science and Engineering, National Tsing Hua Univ., Taiwan
- Dep. of Materials Science and Engineering, National Tsing Hua Uni., Hsinchu, Taiwan
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J. Kwo
- Dept. of Physics, National Tsing Hua Uni., Taiwan
- Dept. of Physics, National Tsing Hua Univ., Taiwan
- Dep. of Physics, National Tsing Hua Uni., Hsinchu, Taiwan
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MOS Ge Diodes Based on High $\kappa $ Gate Dielectrics Grown by MBE and ALD
ORAL
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Authors
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Kun Yu Lee
- Dept. of Materials Science and Engineering, National Tsing Hua Univ., Taiwan
- Department of Materials Science and Engineering, NTHU, Taiwan
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W.C. Lee
- Department of Materials Science and Engineering, NTHU, Taiwan
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T.D. Lin
- Department of Materials Science and Engineering, NTHU, Taiwan
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C.S. Lee
- Department of Materials Science and Engineering, NTHU, Taiwan
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Y.C. Chang
- Department of Materials Science and Engineering, NTHU, Taiwan
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Y.J. Lee
- Department of Materials Science and Engineering, NTHU, Taiwan
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M.L. Huang
- Department of Materials Science and Engineering, NTHU, Taiwan
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Y.D. Wu
- Department of Materials Science and Engineering, NTHU, Taiwan
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M. Hong
- Department of Materials Science and Engineering, NTHU, Taiwan
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J. Kwo
- Department of Physics, NTHU, Taiwan
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Inelastic Electron Tunneling Spectroscopy of Silicon Based MOS Diode with High Permittivity Gate Dielectrics
ORAL
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Authors
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Syuanlong You
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MBE and ALD grown High k Dielectrics Gate Stacks on GaN
ORAL
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Authors
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Y.C. Chang
- Dept. of Materials Science and Engineering, National Tsing Hua Univ., Taiwan
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Kun Yu Lee
- Dept. of Materials Science and Engineering, National Tsing Hua Univ., Taiwan
- Department of Materials Science and Engineering, NTHU, Taiwan
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W.C. Lee
- Dept. of Materials science and Engineering, National Tsing Hua Uni., Taiwan
- Dept. of Materials Science and Engineering, National Tsing Hua Univ., Taiwan
- Dep. of Materials Science and Engineering, National Tsing Hua Uni., Hsinchu, Taiwan
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T.D. Lin
- Dept. of Materials Science and Engineering, National Tsing Hua Univ., Taiwan
- Dep. of Materials Science and Engineering, National Tsing Hua Uni., Hsinchu, Taiwan
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Y.J. Lee
- Dept. of Materials Science and Engineering, National Tsing Hua Univ., Taiwan
- Dep. of Materials Science and Engineering, National Tsing Hua Uni., Hsinchu, Taiwan
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M.L. Huang
- Dept. of Materials Science and Engineering, National Tsing Hua Univ., Taiwan
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M. Hong
- Dept. of Materials science and Engineering, National Tsing Hua Uni., Taiwan
- Dept. of Materials Science and Engineering, National Tsing Hua Univ., Taiwan
- Dep. of Materials Science and Engineering, National Tsing Hua Uni., Hsinchu, Taiwan
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J. Kwo
- Dept. of Physics, National Tsing Hua Uni., Taiwan
- Dept. of Physics, National Tsing Hua Univ., Taiwan
- Dep. of Physics, National Tsing Hua Uni., Hsinchu, Taiwan
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Y.H. Wang
- Dept. of Electrical Engineering, National Cheng-Kung Univ. , Taiwan
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Spectroscopic Study of Band Alignment in Alternative High-k MOS Dielectric Stacks
ORAL
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Authors
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E. Bersch
- Rutgers University
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S. Rangan
- Rutgers University
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E. Garfunkel
- Rutgers University
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R.A. Bartynski
- Rutgers University
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First-principles study of direct electron tunneling through ultra-thin SiO$_{2}$ layers
ORAL
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Authors
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Joongoo Kang
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K.J. Chang
- Department of Physics, Korea Advanced Institute of Science and Technology, South Korea
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Y.-H. Kim
- Department of Materials Science and Engineering, University of Seoul, South Korea
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Search for Sub lattice Disorder in CaCu$_{3}$Ti$_{4}$O$_{12}$
ORAL
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Authors
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Kevin Stone
- Stony Brook University
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Jae-Hyuk Her
- Stony Brook University
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Peter W. Stephens
- SUNY Stonybrook
- State University of New York at Stony Brook
- Stony Brook University
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Jonathan Hanson
- Brookhaven National Laboratory
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Haiding Mo
- Brookhaven National Laboratory
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Christie Nelson
- Brookhaven National Laboratory
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Lijun Wu
- Brookhaven National Laboratory
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Yimei Zhu
- Brookhaven National Laboratory
- Brookhaven National Laboratory, Upton, NY 11973
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Extrinsic Mechanisms for the Giant Dielectric Constant in CaCu$_{3}$Ti$_{4}$O$_{12}$: A Low-Temperature Specific-Heat Study
ORAL
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Authors
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C.P. Sun
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H.D. Yang
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Jianjun Liu
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W.N. Mei
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J.-Y. Lin
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Chun-gang Duan
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Fabrication and properties of TiO$_{2}$ cluster films
ORAL
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Authors
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X. Wei
- Department of Physics and Astronomy and Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, USA
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Y.F Xu
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Z Sun
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Ralph Skomski
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D.J Sellmyer
- Department of Physics and Astronomy and Nebraska Center for Materials and Nanoscience, University of Nebraska
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Second-harmonic generation measurements of porous low-k dielectric materials
ORAL
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Authors
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Joanna Atkin
- Columbia University
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Daohua Song
- Columbia University
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Robert Laibowitz
- Columbia University
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Eduard Cartier
- IBM T. J. Watson Research Center, Yorktown Heights, NY 10598
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Thomas Shaw
- IBM T. J. Watson Research Center, Yorktown Heights, NY 10598
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Robert Rosenberg
- IBM T. J. Watson Research Center, Yorktown Heights, NY 10598
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Tony Heinz
- Columbia University, New York, NY 10027
- Columbia University
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First-principles calculations for the elastic properties of superhard TiN/Si$_{3}$N$_{4}$ superlattices
ORAL
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Authors
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Sanwu Wang
- Department of Physics and Engineering Physics, University of Tulsa, Tulsa, OK 74104
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Y.G. Shen
- Department of Manufacturing Engineering and Engineering Management, City University of Hong Kong, Hong Kong
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Sokrates T. Pantelides
- Department of Physics and Astronomy, Vanderbilt University, Nashville, TN 37235
- Vanderbilt University
- Department of Physics and Astronomy, Vanderbilt University, Nashville, TN 37235 and Oak Ridge National Laboratory, Oak Ridge, TN 37831
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ABSTRACT WITHDRAWN
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