Plasma Etching I

Presentations

• Computational investigation on the effects of ion transport in HAR pattern MASK etching with Ar plasma

  ORAL

  Oct. 14, 2025, 11:00 AM – Oct. 14, 2025, 11:15 AM

  Presenters

  • Byeong Yeop Choi

    • Chungnam National University

  Authors

  • Byeong Yeop Choi

    • Chungnam National University

  • SiJun Kim

    • Chungnam Natl Univ

  • Wonnyoung Jeong

    • Chungnam Natl Univ

  • Youngseok Lee

    • Chungnam Natl Univ

  • Inho Seong

    • Chungnam Natl Univ

  • Chulhee Cho

    • Chungnam Natl Univ

  • Minsu Choi

    • Chungnam Natl Univ

  • ShinJae You

    • Chungnam National University

  View abstract →

• Control of Ion Energy and Angle Distribution via Waveform-Driven Embedded Electrode in Capacitively coupled plasma by using two-dimensional particle in cell simulation

  ORAL

  Oct. 14, 2025, 11:15 AM – Oct. 14, 2025, 11:30 AM

  Presenters

  • Seoi Choi

    • Pusan National University

  Authors

  • Seoi Choi

    • Pusan National University

  • HaeJune Lee

    • Pusan National University

  View abstract →

• Positive Pulse Voltage Superposition to an RF Electrode in a Dual-Frequency Capacitively Coupled Plasma for Relaxation of Positive Charging at Bottom of High Aspect Ratio Holes

  ORAL

  Oct. 14, 2025, 11:30 AM – Oct. 14, 2025, 11:45 AM

  Presenters

  • Takuya Kikuchi

    • Nagoya University

  Authors

  • Takuya Kikuchi

    • Nagoya University

  • Haruka Suzuki

    • Nagoya University; cLPS, Nagoya University

  • Makoto Moriyama

    • Advanced Memory Development Center, Kioxia Corporation

  • Kota Tamura

    • Frontier Technology R&D Institute, Kioxia Corporation.

  • Kuboi Shuichi

    • Frontier Technology R&D Institute, Kioxia Corporation.

  • Daiki Iino

    • Frontier Technology R&D Institute, Kioxia Corporation.

  • Hiroyuki Fukumizu

    • Frontier Technology R&D Institute, Kioxia Corporation.

  • Kazuaki Kurihara

    • Frontier Technology R&D Institute, Kioxia Corporation.

  • Hirotaka Toyoda

    • Nagoya University; cLPS, Nagoya University
    • Nagoya University

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• Remediation of Charging During Pulsed Plasma Etching of High Aspect Ratio Features in Dielectric Materials: Applications to Cryogenic Etching

  ORAL

  Oct. 14, 2025, 11:45 AM – Oct. 14, 2025, 12:00 PM

  Presenters

  • Mark J Kushner

    • University of Michigan

  Authors

  • Chenyao Huang

    • University of Michigan - Ann Arbor

  • Yeon Geun Yook

    • University of Michigan

  • Yifan Gui

    • University of Michigan

  • Mark J Kushner

    • University of Michigan

  View abstract →

• Reliable wafer level plasma diagnostics under various rf bias power

  ORAL

  Oct. 14, 2025, 12:00 PM – Oct. 14, 2025, 12:15 PM

  Presenters

  • DEOKHWAN KIM

    • Hanyang university
    • Department of electrical engineering, Hanyang University, Seoul, Korea
    • Department of Electrical Engineering, Hanyang University

  Authors

  • DEOKHWAN KIM

    • Hanyang university
    • Department of electrical engineering, Hanyang University, Seoul, Korea
    • Department of Electrical Engineering, Hanyang University

  • Hyundong Eo

    • SEMES

  • Oh-Chang Lee

    • Hanyang university

  • Jae-Sung Park

    • Hanyang university

  • Chin-Wook Chung

    • Department of electrical engineering, Hanyang University, Seoul, Korea1
    • Hanyang University

  View abstract →