Workshop: Industrial Applications of Plasma Technology to Microelectronics

Presentations

• Ion and Radical control technologies for the next generation seminconductor fabrication

  ORAL · Invited

  Oct. 13, 2025, 10:00 AM – Oct. 13, 2025, 10:30 AM

  Presenters

  • Jong Chul Park

    • Samsung Electronics R&D Centre

  Authors

  • Jong Chul Park

    • Samsung Electronics R&D Centre

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• Challenges and Approaches of High Aspect Ratio Contact Patterning for Memory Devices

  ORAL · Invited

  Oct. 13, 2025, 10:30 AM – Oct. 13, 2025, 11:00 AM

  Presenters

  • Yeonghun Han

    • SK hynix Inc.

  Authors

  • Yeonghun Han

    • SK hynix Inc.

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• Material Modification and Selective Removal Process for incoming logic and memory device

  ORAL · Invited

  Oct. 13, 2025, 11:00 AM – Oct. 13, 2025, 11:30 AM

  Presenters

  • Jin Chul Son

    • PSK

  Authors

  • Jin Chul Son

    • PSK

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• Study of Plasma Characteristics Using Tailored Pulse DC Bias

  ORAL · Invited

  Oct. 13, 2025, 11:30 AM – Oct. 13, 2025, 12:00 PM

  Presenters

  • Jong Sik Kim

    • Korea Institute of Fusion Energy(KFE)
    • KFE
    • Plasma Equipment Intelligence Convergence Research Center, Korea Institute of Fusion Energy, Korea

  Authors

  • Jong Sik Kim

    • Korea Institute of Fusion Energy(KFE)
    • KFE
    • Plasma Equipment Intelligence Convergence Research Center, Korea Institute of Fusion Energy, Korea

  • Sung-Roc JANG

    • Korea Electrotechnology Research Institute(KERI)

  • Yonghyun Kim

    • Korea Institute of Fusion Energy(KFE)
    • KFE
    • Plasma Equipment Intelligence Convergence Research Center, Korea Institute of Fusion Energy, Korea
    • Korea Institute of Fusion Energy

  • Dae-Chul Kim

    • Korea Institute of Fusion Energy(KFE)
    • Plasma Equipment Intelligence Convergence Research Center, Korea Institute of Fusion Energy, Korea

  • SANGHYEOK PARK

    • Korea Institute of Fusion Energy(KFE)
    • Plasma Equipment Intelligence Convergence Research Center, Korea Institute of Fusion Energy, Korea

  • Jongbae PARK

    • Korea Institute of Fusion Energy(KFE)

  • Jonghyun SHIN

    • Korea Institute of Fusion Energy(KFE)

  • Young-Woo KIM

    • Korea Institute of Fusion Energy(KFE)

  • Jung-Sik YOON

    • Korea Institute of Fusion Energy(KFE)

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• Lunch

  COFFEE_KLATCH

  Oct. 13, 2025, 12:00 PM – Oct. 13, 2025, 1:30 PM

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• Industrial-Driven Innovations in RF Power Systems

  ORAL · Invited

  Oct. 13, 2025, 1:30 PM – Oct. 13, 2025, 2:00 PM

  Presenters

  • Ki Chul Um

    • Advanced Semiconductor Engineering

  Authors

  • Ki Chul Um

    • Advanced Semiconductor Engineering

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• Challenges and solutions for fine pitch high aspect ratio patterning in sub-10nm DRAM device

  ORAL · Invited

  Oct. 13, 2025, 2:00 PM – Oct. 13, 2025, 2:30 PM

  Presenters

  • Kukhan Yoon

    • Samsung Electronics

  Authors

  • Kukhan Yoon

    • Samsung Electronics

  • Woohyun Lee

    • Samsung Electronics

  • Chanhoon Park

    • Samsung Electronics

  • Jongkyu Kim

    • Samsung Electronics

  • Keumjoo Lee

    • Samsung Electronics

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• Opportunities and Challenges at the Edge of Scaling in Advanced Memory and Foundry Technologies

  ORAL · Invited

  Oct. 13, 2025, 2:30 PM – Oct. 13, 2025, 3:00 PM

  Presenters

  • Sangwuk Park

    • Samsung Electronics

  Authors

  • Sangwuk Park

    • Samsung Electronics

  • Jinwoo Han

    • Samsung Electronics

  • Daewon Ha

    • Samsung Electronics

  • Seunghun Lee

    • Samsung Electronics

  • Jinkwan Lee

    • Samsung Electronics

  • Janghee Lee

    • Samsung Electronics

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• AI-based plasma density estimation using MAHA sensor

  ORAL · Invited

  Oct. 13, 2025, 3:00 PM – Oct. 13, 2025, 3:30 PM

  Presenters

  • Kisuk Sung

    • RTM

  Authors

  • Kisuk Sung

    • RTM

  • Heelang Ryu

    • RTM

  • Seungheui Lee

    • RTM

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• Coffee Break

  COFFEE_KLATCH

  Oct. 13, 2025, 3:30 PM – Oct. 13, 2025, 4:00 PM

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• The industrial application of remote plasma sources as an enabling technology for 3D semiconductor fabrications

  ORAL · Invited

  Oct. 13, 2025, 4:00 PM – Oct. 13, 2025, 4:30 PM

  Presenters

  • Jang-Gyoo Yang

    • WONIK IPS

  Authors

  • Tae S Cho

    • Wonik IPS

  • Jang-Gyoo Yang

    • WONIK IPS

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• Electron power absorption dynamics in capacitive RF plasmas: from fundamental understanding to process-relevant parameter control

  ORAL · Invited

  Oct. 13, 2025, 4:30 PM – Oct. 13, 2025, 5:00 PM

  Presenters

  • Li Wang

    • Ruhr University Bochum
    • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

  Authors

  • Li Wang

    • Ruhr University Bochum
    • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

  • Aranka Derzsi

    • Wigner Research Center for Physics
    • HUN-REN Wigner Research Centre for Physics, Budapest, Hungary

  • Peter Hartmann

    • Wigner Research Centre for Physics, Hungary
    • HUN-REN Wigner Research Centre for Physics, Budapest, Hungary

  • Zoltan Donko

    • Wigner Research Center for Physics
    • HUN-REN Wigner Research Centre for Physics, Budapest, Hungary
    • Institute for Solid State Physics and Optics, HUN-REN Wigner Research Centre for Physics

  • Maximilian Ryppa

    • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

  • Constantin Neuroth

    • Ruhr-University Bochum
    • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

  • Florian Beckfeld

    • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

  • Yuanhong Song

    • Dalian University of Technology
    • School of Physics, Dalian University of Technology, Dalian, China
    • Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics, Dalian University of Technology, Dalian

  • Julian Schulze

    • Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

  View abstract →