Effect of xenon gas on deposition of diamond-like carbon film using high power pulsed magnetron sputtering
ORAL
Abstract
A diamond-like carbon (DLC) is an amorphous carbon containing both graphite (sp2 bond) and diamond (sp3 bond) structures, and shows excellent material properties such as high hardness, low friction, and wear resistance. The DLC coatings have been applied to automobile parts, cutting tools and so on. Ion flux to substrate and ion energy around 100 eV is essential to increase the sp3 bond in the DLC film. In this study, the effect of Xe as the rare gas on film property of DLC film and its gas phase on high power pulsed magnetron sputtering using carbon target was investigated due to the ionization potential and mass in comparison with Ar.
The peak current applying to the carbon target was 70A, the pulse width was 10µs, and the frequency was 400 Hz. The total gas flow rate of Xe/Ar mixture gas was 10sccm at a pressure of 0.5 Pa. Xe gas mixture ratio to Ar gas was varied from 0% to 100%.
ID/IG ratio, which is due to disorder and graphite band, was evaluated by Raman scattering spectroscopy. ID/IG ratio was constant of 1.2 for any Xe gas mixture ratio. The flux and energy of carbon ions decreased with increasing Xe gas mixture ratio. Xe ion with high kinetic energy would contribute to the film density of the DLC because mass of Xe is three times larger than that of Ar.
The peak current applying to the carbon target was 70A, the pulse width was 10µs, and the frequency was 400 Hz. The total gas flow rate of Xe/Ar mixture gas was 10sccm at a pressure of 0.5 Pa. Xe gas mixture ratio to Ar gas was varied from 0% to 100%.
ID/IG ratio, which is due to disorder and graphite band, was evaluated by Raman scattering spectroscopy. ID/IG ratio was constant of 1.2 for any Xe gas mixture ratio. The flux and energy of carbon ions decreased with increasing Xe gas mixture ratio. Xe ion with high kinetic energy would contribute to the film density of the DLC because mass of Xe is three times larger than that of Ar.
*This work was partly supported by JSPS KAKENHI Grant No. 22K03590.
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Publication: K. Iga et al., Thin Solid Films 672(2019) 104.
Presenters
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Keita Takeda
- Department of Electrical and Electronic Engineering, Meijo University, Japan