Effects of amplitude modulation discharge on behavior of oxygen ions in Ar/O<sub>2</sub> capacitively coupled plasma studied by particle-in-cell/Monte Carlo collision model

ORAL

Abstract

Oxygen ions (O2+, O-) play key roles in fabrication of SiO2 insulating films by plasma-enhanced chemical vapor deposition (PECVD) [1]. Here, we employed 1d3v PIC-MCC simulations to evaluate effects of amplitude modulation (AM) discharges [2] on behavior of oxygen ions in Ar/O2 plasma. In AM discharges, the amplitude of the applied radio frequency (RF) voltage is varied sinusoidally. The results show that the O2+ and O- ion densities in the central plasma region and the ion energy distribution function (IEDF) of O2+ ions incident on the grounded electrode vary with time for AM discharges. The variation widths increase with the modulation level, which indicates the modulation level is a good tuning knob to control ion density and IEDF. The results offer important information to establishing a deposition model for PECVD using AM discharges and achieving high quality SiO2 films based on the model.

[1] Hu Li, et al., Jpn. J. Appl. Phys. 58 SEED06 (2019). [2] K. Abe, et al., Jpn. J. Appl. Phys. (2022) in press.



*This study was partly supported by JSPS KAKENHI (JP20H00142) and JSPS Core-to-Core Program (JPJSCCA2019002).

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Presenters

  • Iori Nagao

    • Kyushu University

Authors

  • Iori Nagao

    • Kyushu University

  • Akihiro Yamamoto

    • Kyushu University

  • Yuma Yamamoto

    • Kyushu University

  • Kunihiro Kamataki

    • Kyushu Univ
    • Kyushu University
    • Kyushu University, Japan

  • Takamasa Okumura

    • Kyushu University
    • Kyushu University, Japan

  • Naoto Yamashita

    • Kyushu University
    • Kyushu University, Japan

  • Naho Itagaki

    • Kyushu University

  • Kazunori Koga

    • Kyushu Univ
    • Kyushu University
    • Kyushu University, Japan

  • Masaharu Shiratani

    • Kyushu University
    • Kyushu University, Japan