Development of a radial-axial particle-in-cell Monte Carlo collision model for capacitively coupled plasmas

Low-pressure capacitively coupled plasmas (CCPs) are promising for high aspect ratio etching and deposition. CCPs operate by applying a voltage drop between powered and ground electrodes, between which a circuit (e.g., a capacitor) is considered. In this work, a radial-axial particle-in-cell Monte Carlo collision (PIC-MCC) model is developed to study the CCPs. The macroparticle weights of charged particles are varied to minimize the numerical errors near the centerline axis. The results obtained from the present model show good agreement with the PIC-MCC model developed by Rauf [Rauf, PSST 29, 095019 (2020)]. Numerical treatments for the coupling between the circuit and the plasma discharge will be discussed.