A hybrid model of biased inductively coupled discharges$^{\mathrm{1}}$

ORAL

Abstract

A hybrid model, i.e. a global model coupled bidirectionally with a parallel Monte-Carlo collision (MCC) sheath model, is developed to investigate an inductively coupled discharge with a bias source. To validate this model, both bulk plasma density and ion energy distribution functions (IEDFs) are compared with experimental measurements in an argon discharge, and a good agreement is obtained. On this basis, the model is extended to weakly electronegative Ar/O$_{\mathrm{2}}$ plasma. The ion energy and angular distribution functions versus bias voltage amplitude are examined. The different ion species (Ar$^{\mathrm{+}}$, O$_{\mathrm{2}}^{\mathrm{+}}$, O$^{\mathrm{+}})$ have various behaviors because of the different masses. A low bias voltage, Ar$^{\mathrm{+}}$ has a single energy peak distribution and O$^{\mathrm{+}}$ has a bimodal distribution. At high bias voltage, the energy peak separation of O$^{\mathrm{+}}$ is wider than Ar$^{\mathrm{+}}$. $^{\mathrm{1}}$This work has been supported by the National Nature Science Foundation of China (Grant No. 11335004) and Specific project (Grant No 2011X02403-001) and partially supported by Department of Energy Office of Fusion Energy Science Contract DE-SC000193 and a gift from the Lam Research Corporation.

Authors

  • Deqi Wen

    • Dalian University of Technology
  • Michael A Lieberman

    • Uniersity of California, Berkeley
  • Quanzhi Zhang

    • University of Anterwerp
  • Yong-Xin Liu

    • Dalian University of Technology
    • School of Physics and Optoelectronic Technology, Dalian University of Technology,
    • School of Physics and Optoelectronic Technology, Dalian University of Technology, China
  • You-Nian Wang

    • Dalian University of Technology
    • School of Physics and Optoelectronic Technology, Dalian University of Technology,
    • School of Physics and Optoelectronic Technology, Dalian University of Technology, China