Control of ion energy distributions in inductively coupled ratio-frequency plasmas with a biased electrode

ORAL

Abstract

We measured the ion energy distribution (IED) and plasma density as a function of the voltage phase shift $\varphi $ between the source and bias electrode in inductively coupled argon plasma driven at 13.56 MHz by using a retarding field energy analyzer and a commercial Langmuir probe, respectively. Our results demonstrate that under some certain discharge conditions, as the phase shift $\varphi $ increases from 0 to 2$\pi $, the plasma potential slightly decreases with $\varphi $, while the IED exhibits drastic changes in both the IED width and the energy of bimodal distribution. To be specific, as $\varphi $ increases from 0 to $\pi $, the IED width increases and the bimodal distribution shifts to high energy region. However the IED width almost keeps constant and the bimodal distribution shifts to low energy region, when $\varphi $ increases from $\pi $ to 2$\pi $.

*This work was supported by the National Natural Science Foundation of China (NSFC) (Grand Nos. 11335004,11205025, 11405019).

Authors

  • Chan Xue

    • School of Physics and Optoelectronic Technology, Dalian University of Technology, China
  • Wei Liu

    • School of Physics and Optoelectronic Technology, Dalian University of Technology, China
  • Fei Gao

    • School of Physics and Optoelectronic Technology, Dalian University of Technology, China
  • You-Nian Wang

    • Dalian University of Technology
    • School of Physics and Optoelectronic Technology, Dalian University of Technology,
    • School of Physics and Optoelectronic Technology, Dalian University of Technology, China