Plasma Sources
FOCUS · SF1 ·
Presentations
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EED$f$ and IED$f$ of the non-ambipolar e$^{-}$-beam plasma and their effects on etch
COFFEE_KLATCH · Invited
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Authors
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Lee Chen
- Tokyo Electron America, Inc.
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ABSTRACT WITHDRAWN
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Prevention of ion flux inhomogeneities in large area capacitively coupled discharges via the Electrical Asymmetry Effect
ORAL
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Authors
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Edmund Schuengel
- Department of Physics, West Virginia University, Morgantown, WV 26506
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Julian Schulze
- Department of Physics, West Virginia University, Morgantown, WV 26506
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Sebastian Mohr
- Institute for Plasma and Atomic Physics, Ruhr-University Bochum, 44780 Bochum, Germany
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Uwe Czarnetzki
- Institute for Plasma and Atomic Physics, Ruhr-University Bochum, 44780 Bochum, Germany
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Transient response of pulsed multi-source RF CCP discharges
ORAL
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Authors
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Theresa Kummerer
- North Carolina State University
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David Peterson
- North Carolina State University
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David Coumou
- MKS Instruments
- MKS Instruments, ENI Power Division, Rochester NY
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Steven Shannon
- North Carolina State University
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Etching of photoresist with an atmospheric pressure plasma jet
ORAL
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Authors
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Andrew West
- York Plasma Institute, University of York, UK
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Marc van der Schans
- Eindhoven University of Technology, The Netherlands
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Cigang Xu
- Oxford Instruments Plasma Technology, UK
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Timo Gans
- York Plasma Institute, University of York, UK
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Mike Cooke
- Oxford Instruments Plasma Technology, UK
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Erik Wagenaars
- York Plasma Institute, University of York, UK
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Development and characterization of a fast neutral beam source for damage-free etching
ORAL
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Authors
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Mark Bowden
- University of Liverpool
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Daniil Marinov
- The Open University
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Adetokunbo Ayilaran
- The Open University
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Nicholas Braithwaite
- The Open University
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Ziad el Otell
- IMEC
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Hysteresis in Radio-Frequency Inductively Coupled Plasmas
ORAL
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Authors
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Hyo-Chang Lee
- Hanyang University
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Chin-Wook Chung
- Hanyang University
- Department of Electrical Engineering, Hanyang University
- Hanyang Univ.
- Department of Electrical Engineering, Hanyang University, Seoul, 133-791, Republic of Korea
- Department of Electrical Engineering, Hanyang University, Seoul 133-791, South Korea
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