Plasma Aided Implantation

Presentations

• Sheath dynamics and energetic particle distributions on substrates

  COFFEE_KLATCH · Invited

  Oct. 20, 2009, 10:00 AM – Oct. 20, 2009, 10:30 AM

  Authors

  • Michael A. Lieberman

    • University of California at Berkeley
    • Dept. of Electrical Engineering and Computer Science, University of California, Berkeley CA 94720
    • EECS-UC Berkeley
    • University of California, Berkeley, CA 94720
    • UC Berkeley

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• Multi-frequency, finite-wavelength and dc-augmentation effects in large area capacitive sources

  COFFEE_KLATCH · Invited

  Oct. 20, 2009, 10:30 AM – Oct. 20, 2009, 11:00 AM

  Authors

  • Mark Kushner

    • University of Michigan

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• Self-Regulation Plasma Doping for 2D and 3D devices

  ORAL

  Oct. 20, 2009, 11:00 AM – Oct. 20, 2009, 11:15 AM

  Authors

  • Bunji Mizuno

    • Ultimate Junction Technologies Inc.

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• Advanced Dopant Profile Control for Plasma Doping Processes

  ORAL

  Oct. 20, 2009, 11:15 AM – Oct. 20, 2009, 11:30 AM

  Authors

  • Ludovic Godet

    • VSEA

  • Shu Qin

    • Micron Technology, Inc.

  • Ziwei Fang

    • VSEA

  • G.D. Papasouliotis

    • VSEA

  • Timothy Miller

    • VSEA

  • Vikram Singh

    • VSEA

  • Svetlana Radovanov

    • VSEA

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• One-Step, Non-Contact Pattern Transfer by Direct-Current Plasma Immersion Ion Implantation

  ORAL

  Oct. 20, 2009, 11:30 AM – Oct. 20, 2009, 11:45 AM

  Authors

  • Dixon T.K. Kwok

    • City University of Hong Kong

  • Paul K. Chu

    • City University of Hong Kong

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• Transport Coefficients for Electrons in BF3

  POSTER

  Oct. 20, 2009, 11:45 AM – Oct. 20, 2009, 12:00 PM

  Authors

  • Zoran Lj. Petrovic

    • Institute of Physics

  • Zeljka Nikitovic

    • Institute of Physics

  • Olivera Sasic

    • Faculty of Transport and Traffic Engineering

  • Zoran Raspopovic

    • Institute of Physics

  • Vladimir Stojanovic

    • Institute of Physics

  • Svetlana Radovanov

    • Varian Semiconductor Equipment Associates

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