Spin coherence of Er<sup>3+ </sup>in CeO<sub>2</sub> thin film on Silicon at sub-kelvin temperatures

ORAL

Abstract

Erbium ions (Er3+) are promising spin defects for telecom spin-photon interface as quantum memories for quantum communication networks. To this end, we have explored Er3+: CeO2 (cerium dioxide) thin film epitaxially grown on silicon [1,2] as a new CMOS-compatible platform with near-zero nuclear spin environment critical for supporting long-lived spins [3]. This platform has shown promising narrow optical homogeneous linewidth (~440KHz) with a spin relaxation time of ~2.5ms and a spin coherence of ~0.66μs at 3.6K [2]. Here, we report on our studies on Er3+ spin coherence at 15-300mK utilizing on-chip low-impedance 2D superconducting microwave resonator. The design enables an ensemble spin coupling strength ~2MHz with ~4x105 spins for on-chip ESR (electron spin resonance) studies. We find that Er3+ has a spin coherence up to ~180𝜇s at 15mK. We combine experimental data using both 2-pulse and 3-pulse Hahn-echo along with dynamical decoupling sequences and CCE (cluster-correlation expansion) based simulation to explore dominating dephasing processes. These studies point to possible approaches to improve Er3+ spin coherence and the potential of Er3+:CeO2 qubit systems for quantum networks and communication applications.

[1] G. Grant, et al. APL Mater. 12, 021121 (2024).

[2] J. Zhang, et al. npj Quantum Information, in press (2024); arXiv:2309.16785 (2023).

[3] S. Kanai, et al. PNAS. 119, e2121808119 (2022).

*This work is supported by the U.S. Department of Energy, Office of Science, Basic Energy Sciences, Materials Sciences and Engineering Division and Q-NEXT, a U.S. Department of Energy Office of Science National Quantum Information Science Research Centers with additional support from Air Force Office of Scientific Research.

Presenters

  • Sagar Kumar Seth

    • University of Chicago

Authors

  • Sagar Kumar Seth

    • University of Chicago
  • Aneesh Bapat

    • The University of Chicago
  • Jonah Nagura

    • University of Chicago
  • Vrindaa Somjit

    • Argonne National Laboratory
  • Xinhao Li

    • Argonne National Laboratory
  • Gregory D Grant

    • University of Chicago
    • University of Chicago / Argonne National Laboratory
  • Ignas Masiulionis

    • University of Chicago
  • Dafei Jin

    • Argonne National Laboratory
  • Xu Han

    • Argonne National Laboratory
  • F. Joseph Heremans

    • Argonne Nantional Lab
    • Materials Science Division and X-ray Science Division, Argonne National Laboratory
    • Argonne National Laboratory
    • Argonne National Lab
    • University of Chicago
  • Giulia Galli

    • University of Chicago
  • David D Awschalom

    • University of Chicago
    • Pritzker School of Molecular Engineering and Department of Physics, University of Chicago, Chicago, IL, USA
    • Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL 60637, USA.
    • Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL 60637, USA
    • Argonne National Laboratory
  • Supratik Guha

    • Argonne National Laboratory
  • Jiefei Zhang

    • Argonne National Laboratory