Synthesis green emitting PPV thin film via solvent free chemical vapor deposition

A solvent free chemical vapor deposition (CVD) system was build to prepare PPV thin film. $\alpha $,$\alpha $'-dibromo-p-xylene is used as a precursor. The precursor is heated at the precursor chamber to 90 $^{o}$C to sublimit the materials at a base pressure for about 2-3 mTorr. A N$_{2}$ carrier gas is used to deliver the precursor molecules to the reaction chamber. The reaction chamber pressure is kept at 5-40 mTorr with a temperature for about 800 $^{o}$C. Si and ITO substrates are used in the condensation chamber for deposition. Photoluminescence spectra are measured for the deposited PPV.