Li-intercalation-induced ferromagnetism in Cr<sub>1/4</sub>NbSe<sub>2</sub> epitaxial thin films
ORAL
Abstract
The ionic gate technique is a strong method to manipulate the properties of materials, by which we can modify the carrier number significantly. A successful example is the ionic-gate-induced superconductivity in a band insulator SrTiO3 [1]. In the case of magnetism, people could successfully tune the Curie temperature of Fe3GeTe2 [2], switch an artificial lattice antiferromagnet into ferromagnet [3], and also modify the Curie temperature and magnetic anisotropy of Cr3Te4 [4]. Here, we focus on Cr-intercalated NbSe2 as a target material system. We have reported in the previous APS March Meeting that the Cr1/3NbSe2 epitaxial thin films grown by molecular-beam epitaxy exhibit easy-plane ferromagnetism while the Cr1/4NbSe2 thin films do not show ferromagnetism [5]. We also discussed the importance of the carrier number for the emergence of the long-range magnetic order in Cr-intercalated NbSe2 through the series of the vacuum-annealing experiments [5]. In this study, we applied the ion-gating technique to tune the carrier number of the Cr1/4NbSe2 thin films, and observed large modulation in the transport properties including the emergence of the anomalous Hall effect, demonstrating that originally non-ferromagnetic Cr1/4NbSe2 could be tuned to be ferromagnetic via electron doping.
[1] K. Ueno et al. Nat. Mater., 7, 855 (2008).
[2] Y. Deng et al. Nature, 563, 94 (2018).
[3] Q. Yang et al. Nat. Commun., 9, 991 (2018).
[4] H. Matsuoka et al. arXiv:2304.11890 (2023).
[5] X. Huang et al. D39.00003, APS March Meeting 2023.
[1] K. Ueno et al. Nat. Mater., 7, 855 (2008).
[2] Y. Deng et al. Nature, 563, 94 (2018).
[3] Q. Yang et al. Nat. Commun., 9, 991 (2018).
[4] H. Matsuoka et al. arXiv:2304.11890 (2023).
[5] X. Huang et al. D39.00003, APS March Meeting 2023.
*This research was supported by the World-leading Innovative Graduate Study Program for Quantum Science and Technology Fellowship Program (WINGS-QSTEP).
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Presenters
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Xiang Huang
- University of Tokyo
- Univ of Tokyo