Contactless electronic compressibility measurements of few-layer WSe<sub>2</sub>

ORAL

Abstract

Over the past decade, the discovery of intriguing quantum phenomena such as non-trivial topology, superconductivity, and quantum Hall effects have generated intense interest in layered transition metal dichalcogenides (TMDs). Unlike in graphene, poor contacts have impeded the thorough study of TMD systems at millikelvin temperatures. We have developed a novel “contactless capacitance” method to circumvent the issue of poor contacts and enable compressibility and charge transport measurements on these materials at very low temperatures and carrier densities inaccessible to current electronic measurement techniques. We demonstrate our new technique on mono- and few-layer WSe2 flakes, demonstrating high device quality and our ability to measure delicate quantum phenomena without the need for low-resistance contacts.

*This work is supported by the Basic Energy Sciences Program of the Office of Science of the U.S. Department of Energy through contract no. FG02-08ER46514. S.A. is partially supported by NSF Graduate Research Fellowship Program via grant no. 1122374

–

Presenters

  • Samuel H Aronson

    • Massachusetts Institute of Technology
    • Massachusetts Institute of Technology MI

Authors

  • Samuel H Aronson

    • Massachusetts Institute of Technology
    • Massachusetts Institute of Technology MI

  • Jackson P Butler

    • Massachusetts Institute of Technology

  • Madisen A Holbrook

    • Columbia University

  • Luke N Holtzman

    • Columbia University

  • Kenji Watanabe

    • National Institute for Materials Science
    • NIMS
    • Research Center for Electronic and Optical Materials, National Institute for Materials Science
    • Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
    • National Institute for Material Science

  • Takashi Taniguchi

    • Kyoto Univ
    • National Institute for Materials Science
    • Research Center for Materials Nanoarchitectonics
    • Research Center for Materials Nanoarchitectonics, National Institute for Materials Science
    • National Institute for Materials Sciences
    • NIMS
    • International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
    • National Institute for Material Science
    • International Center for Materials Nanoarchitectonics, NIMS, Japan
    • International Center for Materials Nanoarchitectonics, Tsukuba
    • National Institue for Materials Science
    • Kyoto University
    • National Institute of Materials Science
    • International Center for Materials Nanoarchitectonics and National Institute for Materials Science

  • Katayun Barmak

    • Columbia Univ
    • Columbia University

  • James C Hone

    • Columbia University

  • Raymond C Ashoori

    • Massachusetts Institute of Technology
    • Massachusetts Institute of Technology MIT