Desorption timescales on epitaxial graphene via Fermi level shifting and Reststrahlen monitoring

ORAL

Abstract

We report experimental results related to the transience of hole doping in epitaxial graphene-based devices when nitric acid is used as an adsorbent. The desorption processes are monitored under vacuum conditions by electrical and spectroscopic means to extract the relevant timescales from the corresponding data. The measurements are mostly performed at room temperature, with some electrical transport data collected at 1.5 K. The relevant timescales from transport measurements are compared with the results obtained from X-ray photoelecton spectroscopy and Fourier transform infrared spectroscopy measurements, with the latter performed at ambient conditions and accompanied by calculations of the spectra in the Reststrahlen band. This approach can elucidate the reversible nature of hole doping while also providing a suitable alternative for large-scale device doping that need not rely on standard metallic gating.

*M.K. acknowledges support from the National Institute of Standards and Technology Financial Assistance Award with Federal Award ID 70NANB19H152. B.H. (Senior Research Associate) acknowledges financial support from the F.R.S.-FNRS (Belgium).

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Publication: Tran NT, Mhatre SM, Santos CN, Biacchi AJ, Kelley ML, Hill HM, Saha D, Liang CT, Elmquist RE, Newell DB, Hackens B, Hacker CA, Rigosi AF. Desorption timescales on epitaxial graphene via Fermi level shifting and Reststrahlen monitoring. Carbon. 2022 Sep 1;197:350-8.

Presenters

  • Ngoc Thanh Mai Tran

    • University of Maryland, College Park

Authors

  • Albert F Rigosi

    • National Institute of Standards and Technology
    • National Institute of Standards and Tech

  • Swapnil M Mhatre

    • National Taiwan University

  • Ngoc Thanh Mai Tran

    • University of Maryland, College Park

  • Cristiane N Santos

    • Institut d'Électronique de Microélectronique et de Nanotechnologie, Université de Lille, Villeneuve-d'Ascq 59650, France

  • Adam Biacchi

    • National Institute of Standards and Technology (NIST)
    • National Institute of Standards and Technology

  • Mathew L Kelley

    • National Institute of Standards and Technology

  • Heather M Hill

    • National Institute of Standards and Technology

  • Dipanjan Saha

    • National Institute of Standards and Technology

  • Chi-Te Liang

    • Natl Taiwan Univ
    • National Taiwan University

  • Randolph E Elmquist

    • National Institute of Standards and Technology

  • David B Newell

    • National Institute of Standards and Technology

  • Benoit Hackens

    • IMCN/NAPS Université catholique de Louvain, Louvain-la-Neuve 1348, Belgium

  • Christina A Hacker

    • National Institute of Standards and Technology