Ferroelectric field effect in few-layer CrCl<sub>3</sub> tunnel junctions top-gated by PbZr<sub>0.2</sub>Ti<sub>0.8</sub>O<sub>3</sub> membranes
ORAL
Abstract
We report the ferroelectric gating control of few-layer antiferromagnetic CrCl3 tunnel junctions. High-quality CrCl3 flakes are synthesized on mica by the physical vapor transport technique [1]. Epitaxial ferroelectric PbZr0.2Ti0.8O3 (PZT) films (50 nm) are deposited on Sr3Al2O6 (SAO) buffered (001) SrTiO3 substrates and suspended via dissolving the SAO layer in water. Selected few-layer CrCl3 flakes are fabricated into graphite/CrCl3/graphite tunnel junctions by the all-dry stamping transfer method, which are encapsulated by either PZT membranes or h-BN flakes. Using conductive atomic force microscopy, we pole the PZT top-layer to uniformly polarized up and down states. Polarization reversal leads to nonvolatile modulation of the tunneling current, with an on/off ratio of 106 obtained at room temperature. Compared with h-BN encapsulated devices, the PZT-gated CrCl3 tunnel junctions exhibit distinct magnetotransport properties. The tunneling magnetoresistance changes sign at low temperature, suggesting a change of magnetic state. Our study provides an effectively strategy to design CrCl3-based nonvolatile memory and spintronic applications.
*This work was supported by NSF (DMR-2118828 and Nebraska ERSCoR OIA-2044049) and Nebraska Center for Energy Sciences Research.
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Publication:Jia Wang, et al., arXiv:2208.06298 (2022).
Presenters
Jia Wang
Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln
University of Nebraska-Lincoln
Department of Physics and Astronomy & Nebraska Center for Materials and NanoscienceUniversity of Nebraska-Lincoln
Physics and Astronomy, University of Nebraska-Lincoln
Authors
Jia Wang
Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln
University of Nebraska-Lincoln
Department of Physics and Astronomy & Nebraska Center for Materials and NanoscienceUniversity of Nebraska-Lincoln
Physics and Astronomy, University of Nebraska-Lincoln
Qiuchen Wu
University of Nebraska - Lincoln
Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln
Department of Physics and Astronomy & Nebraska Center for Materials and NanoscienceUniversity of Nebraska - Lincoln
Physics and Astronomy, University of Nebraska-Lincoln
Kun Wang
University of Nebraska - Lincoln
Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln
Department of Physics and Astronomy & Nebraska Center for Materials and NanoscienceUniversity of Nebraska - Lincoln
Physics and Astronomy, University of Nebraska-Lincoln
Takashi Taniguchi
National Institute for Materials Science
Kyoto Univ
International Center for Materials Nanoarchitectonics, National Institute of Materials Science
Kyoto University
International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-044, Japan
International Center for Materials Nanoarchitectonics, National Institute for Materials Science
National Institute for Materials Science, Japan
National Institute For Materials Science
NIMS
National Institute for Material Science
International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba, Japan
NIMS Japan
Kenji Watanabe
National Institute for Materials Science
Research Center for Functional Materials, National Institute of Materials Science
Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-044, Japan
NIMS
Research Center for Functional Materials, National Institute for Materials Science
National Institute for Materials Science, Japan
Research Center for Functional Materials, National Institute for Materials Science, Tsukuba, Japan
NIMS Japan
Xia Hong
Physics and Astronomy, University of Nebraska-Lincoln
Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln