Electrostatic single exciton trapping in a 2D semiconductor heterostructure using nanopatterned graphene
ORAL
Abstract
Interlayer excitons (IXs) in 2D semiconductors have long lifetimes and spin-valley coupled physics, with a long-standing goal of single exciton trapping for quantum applications. In this work, we use a nano-patterned graphene gate to create an electrostatic IX trap. In photoluminescence measurements, we observe narrow linewidth emission, which is a signature of strong spatial confinement, and a unique power-dependent blue-shift of IX energy, with jumps between discrete emission energies. We attribute these jumps to quantized increases of the number occupancy of IXs within the trap. We compare these results to a theoretical model to assign the lowest energy emission line to single IX recombination, indicating that we can create a population of a single exciton within our trap using low laser excitation power. These traps are advantageous over other trapping methods involving strain or moiré potentials due to their deterministic lithographically defined process, 100 meV energy tunability by applied gate voltage, and scalability to create large arrays of single quantum emitters with controllable placement.
*JRS and BJL acknowledge support from the National Science Foundation Grant. Nos. ECCS-2054572 and DMR-2003583 and the Army Research Office under Grant no. W911NF-20-1-0215. JRS acknowledges support from Air Force Office Scientific Research Grant Nos. FA9550-18-1-0390 and FA9550-21-1-0219. BJL acknowledges support from the Army Research Office under Grant no. W911NF-18-1-0420. DGM acknowledges support from the Gordon and Betty Moore Foundation’s EPiQS Initiative, Grant GBMF9069. K.W. and T.T. acknowledge support from JSPS KAKENHI (Grant Numbers 19H05790, 20H00354 and 21H05233). Plasma etching was performed using a Plasmatherm reactive ion etcher acquired through an NSF MRI grant, award no. ECCS-1725571.
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Publication:Single exciton trapping in an electrostatically defined 2D semiconductor quantum dot. arXiv:2206.13427. Accepted for publication in Physical Review B.
Presenters
Daniel N Shanks
University of Arizona
Authors
Daniel N Shanks
University of Arizona
Fateme Mahdikhanysarvejahany
University of Arizona
David G Mandrus
University of Tennessee
Oak Ridge National Laboratory
Michael Koehler
University of Tennessee
University of Tennessee, Knoxville
Takashi Taniguchi
National Institute for Materials Science
Kyoto Univ
International Center for Materials Nanoarchitectonics, National Institute of Materials Science
Kyoto University
International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-044, Japan
International Center for Materials Nanoarchitectonics, National Institute for Materials Science
National Institute for Materials Science, Japan
National Institute For Materials Science
NIMS
National Institute for Material Science
International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba, Japan
NIMS Japan
Kenji Watanabe
National Institute for Materials Science
Research Center for Functional Materials, National Institute of Materials Science
Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-044, Japan
NIMS
Research Center for Functional Materials, National Institute for Materials Science
National Institute for Materials Science, Japan
Research Center for Functional Materials, National Institute for Materials Science, Tsukuba, Japan