Eliminating the T<sub>g</sub>- and Fragility-Confinement Effects in Polystyrene Films with Very Low Levels of 2-Ethylhexyl Acrylate Comonomer

ORAL

Abstract

With nanoconfinement below 50 nm thickness, polystyrene (PS) films exhibit glass transition temperature (Tg) values reduced relative to Tg(bulk). Such effects are eliminated down to 15 nm thickness with copolymers of styrene (S) with low levels of 2-ethylhexyl acrylate (EHA). Confinement effects in 98/2 and 94/6 mol% S/EHA copolymers were studied by ellipsometry on piranha-treated and dichlorodimethylsilane-treated silicon wafers. The Tg-confinement effect was eliminated in both cases. Thus, interfacial hydrogen bonds play no significant role in eliminating the effect. Dynamic fragility (m) of bulk films decreases strongly with EHA content; m decreases from 166 to 139 to 103 as EHA increases from 0 to 2 to 6 mol%. Nanoconfinement effects on m are very strong for PS, relatively weak for 98/2 mol% S/EHA copolymers and absent for 94/6 mol% S/EHA. This suggests that the elimination of confinement effect with 2-6 mol% EHA originates from EHA improving the bulk chain packing efficiency and reducing the susceptibility to free-surface perturbations. Notably, these results are not generalizable to other acrylate monomers, e.g., n-butyl acrylate.

*This research was supported by the University Partnership Initiative between Northwestern University and The Dow Chemical Company and by discretionary funds from a Walter P. Murphy Professorship (J.M.T.). This research made use of the IMSERC NMR and MS facility at Northwestern University, which has received support from the Soft and Hybrid Nanotechnology Experimental (SHyNE) Resource (NSF ECCS-2025633), the State of Illinois, International Institute for Nanotechnology (IIN) and Northwestern University.

Publication: Wang, T.; Hu, S.; Zhang, S.; Peera, A.; Reffner, J.; Torkelson, J. M. Eliminating the Tg-Confinement Effect in Polystyrene Films: Extraordinary Impact of 2 mol% 2-Ethylhexyl Acrylate Comonomer. (submitted)

Presenters

  • Tong Wang

    • Northwestern University

Authors

  • Tong Wang

    • Northwestern University
  • Sumeng Hu

    • Northwestern University
  • Sipei Zhang

    • Dow Chemical Co
  • Asghar Peera

    • Dow Chemical Co
  • John Reffner

    • Dow Chemical Co
  • John M Torkelson

    • Northwestern University