Ion beam induced infrared color centers in silicon as quantum emitters and sensors of irradiation damage
ORAL
Abstract
Infrared color centers in Si have become emerging candidates for on-chip integrated quantum emitters, optical access quantum memories and sensing. Here, we studied the formation dynamics of G color centers in Si with as-received carbon under various ion beam irradiations, and demonstrated using G centers as a sensitive probe for irradiation damage and atomic disorder. For G centers formed by 1 MeV cw proton irradiation, the G center preserves narrow optical linewidth < 0.08 nm, as fluence increased from 109 cm-2 to 1013 cm-2. Meanwhile, under the ns-pulsed irradiation, the linewidth broadens significantly up to 0.13 nm, which indicates the pulsed protons creating a larger degree of atomic disorder. However, the PL decay time of G centers decreases for both irradiations as the proton fluence are increased, implying that the two different irradiations introduce a similar amount of nonradiative defects. The difference in linewidth broadening versus a similar amount of nonradiative defects between the two irradiations indicates that the pulsed proton introduces vacancy clusters causing a stronger degree of atomic disorder. In addition, we observe significantly broader G center linewidth (0.16 nm) from Ar irradiation, with 3 orders of magnitude more damage events, which further suggests the dense damage cascades induced vacancy clusters.
*This work at Berkeley Lab was supported by the Office of Science, Office of Fusion Energy Sciences, of the U.S. Department of Energy, under Contract No. DE-AC02-05CH11231.
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Publication: 1. Effect of Localization on Photoluminescence and Zero-Field Splitting of Silicon Color Centers, Physical Review B in press, preprint on arXiv:2206.04824
2. Exploration of Defect Dynamics and Color Center Qubit Synthesis with Pulsed Ion Beams, Quantum Beam Sci. 2022, 6(1), 13
3. Defect engineering of silicon with ion pulses from laser acceleration, preprint arXiv:2203.13781
Presenters
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Wei Liu
- Accelerator Technology and Applied Physics Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA
- ATAP, Lawrence Berkeley National Lab