Configurable crack wall conduction in oxide nanoelectronics
ORAL
Abstract
Mobile defects in solid-state materials play a significant role in memristive switching and energy-efficient neuromorphic computation. Techniques for confining and manipulating point defects may have great promise for low-dimensional memories. Here, we report the spontaneous gathering of oxygen vacancies at strain-relaxed crack walls in SrTiO3 thin films grown on DyScO3 substrates as a result of flexoelectricity. We found that electronic conductance at the crack walls was enhanced compared to the crack-free region, by a factor of 104. A switchable asymmetric diode-like feature was also observed, and the mechanism is discussed, based on the electrical migration of oxygen vacancy donors in the background of Sr-deficient acceptors forming n+-n or n-n+ junctions. By tracing the temporal relaxations of surface potential and lattice expansion of a formed region, we determine the diffusivity of mobile defects is consistent with oxygen vacancy kinetics of SrTiO3 (1.4×10-16 cm2/s). Our finding opens a new avenue into defect-mediated crack wall nanoelectronics.
*This work has been supported by the National Research Foundation (NRF) of Korea Grant funded by the Korean Government via the Creative Research Center for Lattice Defectronics (Grant No. NRF-2017R1A3B1023686). S.-Y.C. acknowledges the support of the Korea Basic Science Institute (National research Facilities and Equipment Center) Grant (2020R1A6C1020259) funded by the Ministry of Education.
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Presenters
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Youngki YEO
- KAIST