Comparing Cr-Doped (Bi<sub>x</sub>Sb<sub>1-x</sub>)<sub>2</sub>Te<sub>3</sub> to Graphene as a Future Platform for Quantum Hall Resistance Standards

ORAL

Abstract

Since 2017, epitaxial graphene has been the base material for the US national standard for resistance. Due to a relaxed magnetic field and temperature requirement, these graphene-based devices enabled more user-friendly access to the quantum Hall effect and could more easily be deployed into US and global industries compared to GaAs-based devices. A future avenue of research within electrical metrology is to remove the need for strong magnetic fields, as is currently the case for devices exhibiting the quantum Hall effect. New materials, like magnetically doped topological insulators (MTIs), offer access to the quantum anomalous Hall effect, which in its ideal form, could become a future resistance standard needing only a small permanent magnet to activate a quantized resistance value. Furthermore, these devices could operate at zero-field for measurements, making the dissemination of the ohm more economical and portable. Here we present results on precision measurements of the h/e^2 quantized plateau of Cr-Doped (BixSb1-x)2Te3 and give them context by comparing them to modern graphene-based resistance standards. Ultimately, MTI-based devices could be combined in a single system with magnetic-field-averse Josephson voltage standards to obtain an alternative quantum current standard.

*This material is based upon work supported by the Department of Energy, Office of Science, Basic Energy Sciences, Materials Sciences and Engineering Division, under Contract DE-AC02-76SF00515.

Presenters

  • Albert F Rigosi

    • National Institute of Standards and Technology
    • National Institute of Standards and Tech

Authors

  • Albert F Rigosi

    • National Institute of Standards and Technology
    • National Institute of Standards and Tech
  • Linsey Rodenbach

    • Stanford Univ
  • Alireza Panna

    • National Institute of Standards and Technology
  • Shamith Payagala

    • National Institute of Standards and Technology
  • Ilan Rosen

    • Stanford Univ
  • Joseph A Hagmann

    • National Institute of Standards and Technology
  • Peng Zhang

    • University of California, Los Angeles
  • Lixuan Tai

    • University of California, Los Angeles
  • Kang-Lung Wang

    • University of California, Los Angeles
  • Dean Jarrett

    • National Institute of Standards and Technology
  • Randolph E Elmquist

    • National Institute of Standards and Technology
  • Jason M Underwood

    • National Institute of Standards and Technology
  • David B Newell

    • National Institute of Standards and Technology
  • David Goldhaber-Gordon

    • Stanford University
    • Stanford Univ