Engineering magnetic topological insulators in Eu-based Zintls

ORAL

Abstract

In Zintl materials, the rocksalt-like charge separation between the cationic and anionic frameworks offers a vital platform for the exploration of magnetic topological insulators. When the cations are magnetic and the anions are non-magnetic, it often causes the materials to behave as two independent subunits, with separate magnetic and electronic behaviors. In addition, the clear separation between the electronic and magnetic energy scales allows us to tune the electronic structure of the polyanionic network and then consider the effect of magnetism. This band engineering approach is achieved by employing doping, element substitution, pressure, and epitaxial strain. Specifically, starting from the trivial antiferromagnetic insulator Eu5In2Sb6, we utilize density functional theory to engineer band inversions by applying chemical pressure via isoelectronic substitution, and use external pressure and epitaxial strain to control the bulk energy gaps. Our approach results in the prediction of three new antiferromagnetic topological insulator candidates: Eu5Ga2Sb6, Eu5Tl2Sb6, and Eu5In2Bi6.

*This work was supported as part of the Institute for Quantum Matter, an Energy Frontier Research Center funded by the U.S. Department of Energy, Office of Science, Basic Energy Sciences under Award No. DE-SC0019331.

Presenters

  • Nicodemos Varnava

    • Rutgers University, New Brunswick
    • Rutgers University

Authors

  • Nicodemos Varnava

    • Rutgers University, New Brunswick
    • Rutgers University
  • David Vanderbilt

    • Rutgers University
    • Rutgers University, New Brunswick
  • Tyrel M McQueen

    • Johns Hopkins University
    • Department of Chemistry, The Johns Hopkins University
  • Tanya Berry

    • Johns Hopkins University
  • Vincent C Morano

    • Johns Hopkins University
  • Rishi Bhandia

    • Johns Hopkins University
  • Anaelle Legros

    • Johns Hopkins University
  • Will Liang

    • Johns Hopkins University
  • Chris J Lygouras

    • Johns Hopkins University
    • John Hopkins University
  • Thomas J Halloran

    • Johns Hopkins University
  • Collin L Broholm

    • Johns Hopkins University
    • John Hopkins University
  • Jonathan Gaudet

    • National Institute of Standards and Technology
    • Johns Hopkins University
  • Guangyong Xu

    • NIST
  • Jeffrey W Lynn

    • National Institute of Standards and Tech
    • National Institute of Standards and Technology