Insulator-metal transition in the rutile structure of ultrathin VO<sub>2</sub> films on (001) TiO<sub>2</sub>

ORAL

Abstract

The origin of the insulator-metal transition (IMT) in VO2 is not well understood due to the concurrent monoclinic-rutile transition (MRT). The long-standing dilemma is whether the IMT occurs due to the breakdown of Mott electron-electron correlations or due to the melting of Peierls charge density wave under the influence of controllable parameters. To solve the dilemma, we investigate ultrathin VO2 films on rutile (001) TiO2 substrates by using synchrotron XRD, electrical transport, and optical techniques. We reveal that below the critical thickness of 7.5 nm, the VO2 films persist in the rutile structure before and after the IMT avoiding Peierls ordering and, thus, the MRT. The observed pure electronic Mott IMT holds the key to understanding VO2 and other phase-change materials and to boosting their application potential.

*This work was supported by Institute of Information & Communications Technology Planning & Evaluation (IITP) grant funded by the Korean government (MSIT) via Grant 2017-0-00830.

Presenters

  • Tetiana Slusar

    • ETRI

Authors

  • Tetiana Slusar

    • ETRI
  • David J Lahneman

    • College of William and Mary
    • Department of Physics, College of William & Mary
  • Douglas Beringer

    • Applied Research Center, College of William & Mary
  • Haoyue Jiang

    • College of William and Mary
    • Department of Physics, College of William & Mary
  • Chang-Yong Kim

    • Canadian Light Source
  • M.Mumtaz Qazilbash

    • College of William and Mary
    • Department of Physics, College of William & Mary
    • College of William & Mary
  • Hyun-Tak Kim

    • ETRI