Hall effect in ionic liquid-gated single-wall carbon nanotube films

ORAL

Abstract

The presence of hopping carriers and grain boundaries can sometimes lead to anomalous carrier types and density overestimation in Hall-effect measurements. Previous Hall-effect studies on carbon nanotube films reported unreasonably large carrier densities without independent assessments of the carrier types and densities. Here, we have systematically investigated the validity of Hall-effect results for a series of metallic, semiconducting, and metal-semiconductor-mixed single-wall carbon nanotube films. With carrier densities controlled through applied gate voltages, we were able to observe the Hall effect both in the n- and p-type regions, detecting opposite signs in the Hall coefficient. By comparing the obtained carrier types and densities against values derived from simultaneous field-effect-transistor measurements, we found that, while the Hall carrier types were always correct, the Hall carrier densities were overestimated by up to four orders of magnitude. This significant overestimation indicates that thin films of one-dimensional SWCNTs are quite different from conventional hopping transport systems.

*This study was partially supported by JST CREST (Grant Numbers JPMJCR17I5) and JSPS KAKENHI (Grant Numbers JP20H02573, JP19K15392, JP18H01816, JP17H01069, JP17H06124, and JP19J21142). N.K., W.G., and J.K. were supported by the Department of Energy Basic Energy Sciences through grant no. DEFG02-06ER46308 (optical spectroscopy characterization experiments) and the Robert A. Welch Foundation through grant no. C-1509 (sample preparation).

Presenters

  • Yohei Yomogida

    • Tokyo Metropolitan Univ

Authors

  • Yohei Yomogida

    • Tokyo Metropolitan Univ
  • Kazuhiro Yanagi

    • Tokyo Metropolitan Univ
  • Kanako Horiuchi

    • Tokyo Metropolitan Univ
  • Junichiro Kono

    • Rice Univ
    • Rice University
  • Natsumi Komatsu

    • Rice University
  • Weilu Gao

    • University of Utah
    • Electrical and Computer Engineering, University of Utah
  • Kan Ueji

    • Tokyo Metropolitan University
    • Tokyo Metropolitan Univ
  • Yota Ichinose

    • Tokyo Metropolitan Univ
  • Hiroyuki Nishidome

    • Tokyo Metropolitan Univ