Structural and Magnetotransport Properties of Epitaxial Ferrimagnetic Mn<sub>4</sub>N Thin Films on GaN by Plasma-assisted Molecular Beam Epitaxy

ORAL

Abstract

The III-nitride family of wide bandgap semiconductors are of great importance for diverse applications ranging from solid-state lighting to RF and power electronics (D. Jena, Jpn. J. Appl. Phys. 58, SC0801 (2019)). Integration of ferromagnets on GaN will be important building block not only for device applications aiming to merge logic, memory and communication components but also for studying spin-related phenomena in non-centrosymmetric semiconductors.
Mn4N, a room temperature metallic nitride ferrimagnet is of high interest for applications exploiting spin torques, due to its large spin polarization, strong perpendicular magnetic anisotropy, low saturation magnetization and high domain wall velocities (T. Gushi, Nano Lett. 19, 8716 (2019)).
Here we report integration of Mn4N on GaN with smooth surface by plasma assisted molecular beam epitaxy. The structural and magnetic properties of Mn4N on GaN, including growth mode, lattice spacing, surface morphology, Hall resistance are tailored by varying the growth parameters. Square hysteresis loops with large remanence (>90%) and moderate coercive field (~0.5T) are achieved.

*This work was supported by Semiconductor Research Corporation (SRC) as nCORE task 2758.001 and NSF under the E2CDA program (ECCS 1740286) and NewLAW EFRI 1741694.

Presenters

  • Zexuan Zhang

    • Cornell University

Authors

  • Zexuan Zhang

    • Cornell University
  • Yongjin Cho

    • Cornell University
  • Celesta S Chang

    • Cornell University
  • Mingli Gong

    • Cornell University
  • Shaoting Ho

    • Cornell University
  • Jashan Singhal

    • Cornell University
    • School of Electrical and Computer Engineering, Cornell University
  • Huili Grace Xing

    • Cornell University
  • Debdeep Jena

    • Cornell University