Spin-orbit mediated modulation of defect-phonon coupling in transition metal dichalcogenides

ORAL

Abstract

The formation of defects is unavoidable in 2D materials with currently available growth techniques. Nevertheless, a myriad of modern optoelectronic and nanophotonic devices leverages on functionalities like single-photon emission from point defects in solid-state materials. In parallel, advances in atomic-resolution imaging techniques provide opportunities to directly create, manipulate, and characterize defects on the atomic scale in 2D materials. Therefore, we present theoretical calculations and analysis of quantum defects in 2D materials. We study the electron-phonon interactions of electronic transitions in defects and quantify their optical efficiency by calculating the Huang-Rhys factor1. This presents a pathway for maximizing their optical efficiency and provides a deterministic choice for defect creation at the atomic scale using scanning probe techniques.
1Axriv 2007.14399

*DOE `Photonics at Thermodynamic Limits EFRC DE-SC0019140
DOE, BES, Materials Sciences and Engineering Division FWP ERKCK47 `Understanding and Controlling Entangled and Correlated Quantum States in Confined Solid-state Systems via Atomic Scale Manipulation'
Army Research Office MURI (Ab-Initio Solid-State Quantum Materials) W911NF-18-1-0431
Moore Inventor Fellow GBMF8048 Gordon and Betty Moore Foundation

Presenters

  • Chitraleema Chakraborty

    • Massachusetts Institute of Technology MIT
    • Harvard University

Authors

  • Chitraleema Chakraborty

    • Massachusetts Institute of Technology MIT
    • Harvard University
  • Christopher Ciccarino

    • Harvard University
    • Physics, Harvard University
  • Prineha Narang

    • Harvard University
    • SEAS, Harvard University
    • John A. Paulson School of Engineering & Applied Science, Harvard University
    • Harvard John A. Paulson School of Engineering and Applied Sciences, Harvard University
    • Physics, Harvard University
    • John A. Paulson School of Engineering and Applied Sciences, Harvard University