In-situ growth and fabrication of planar ferromagnetic semiconductor-based Josephson junctions

ORAL

Abstract

The superconductor(S)/ferromagnet(F)/superconductor(S) structures attract attention as a platform of unconventional superconductivity. For the realization of practical SFS devices and novel emergent states such as Majorana fermions, improvement of the S/F interface quality is required. We report an in-situ epitaxial growth using molecular beam epitaxy (MBE) and fabrication of nano-size Josephson junctions (JJs) with s-wave superconductor Al electrodes grown on (In,Fe)As or InAs/(Ga,Fe)Sb heterostructures, where (In,Fe)As and (Ga,Fe)Sb are Fe-doped FMSs. The InAs junctions are made ferromagnetic either by doping Fe [(In,Fe)As] or by the magnetic proximity effect from an Fe-doped FMS [(Ga,Fe)Sb] [1]. We fabricate planar Al/FMS/Al JJ structures with a nano-size trench (< 100 nm) by electron beam lithography. Electrical transport measurements confirmed that the Al layers are superconducting with critical temperature TC of 1 – 1.2 K. In the presentation, we will further discuss many aspects of epitaxial growth and electrical transport measurements in these ferromagnetic JJs.
[1] K. Takiguchi et al., Nat. Phys. 15, 1134 (2019).

*This work was partly supported by CREST program (JPMJCR1777) and PRESTO Program (JPMJPR19LB) of JST, and Spintronics Research Network of Japan (Spin-RNJ).

Presenters

  • Keita Ishihara

    • Univ of Tokyo

Authors

  • Keita Ishihara

    • Univ of Tokyo
  • Le Duc Anh

    • Institute of Engineering Innovation, The University of Tokyo
    • Univ of Tokyo
  • Masaaki Tanaka

    • Department of Electrical Engineering and Information Systems, The University of Tokyo
    • Electrical Engineering and Information System, Univ of Tokyo
    • Electrical Engineering and Information Systems, Univ of Tokyo
    • Univ of Tokyo