Josephson Parametric Amplifiers Fabricated in Wafer-scale with Side-wall Passivated Spacer Junction Technology
ORAL
Abstract
We present our latest experimental results on Josephson parametric amplifiers (JPAs) fabricated with our Nb/Al-AlOx/Nb junction process. The fabrication relies on UV photolithography and semi-automated 150-mm wafer processing steps, while minimizing the amount of deposited lossy dielectric materials [1]. The first JPA category is a flux-driven reflection amplifier for sub-GHz frequencies. It has found applications in the rf reflectometry of quantum dots, as well as in the rf readout of microwave nanobolometers [2] and charge detectors. Secondly, we report on the development of a 4-8 GHz traveling wave parametric amplifier tailored for the readout of superconducting quantum bits.
[1] Leif Grönberg et al., Superconductor Science and Technology 30, 125016 (2017)
[2] Roope Kokkoniemi et al., Communications Physics 2, 124 (2019)
[1] Leif Grönberg et al., Superconductor Science and Technology 30, 125016 (2017)
[2] Roope Kokkoniemi et al., Communications Physics 2, 124 (2019)
*This research was funded by EU Quantum Flagship (OpenSuperQ, QMiCS), and Academy of Finland (312059, 312294, 321700).
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Presenters
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Visa Vesterinen
- VTT Technical Research Centre of Finland Ltd
- Micro & Nanoelectronics, VTT Technical Research Centre of Finland