InAs(111) Homoepitaxy with Molecular Beam Epitaxy

ORAL

Abstract

In this study we have mapped the growth parameters for optimal homoepitaxy of InAs on InAs(111)A substrates using molecular beam epitaxy. Increasing the substrate temperature reveals a transition from 2D flat island growth to step-flow. The optimized parameters we established (substrate temperature = 500° C, growth rate = 0.12ML/s and V/III ratio = 48) produce an atomically flat surface, free of 3D imperfections. We study material quality using photoluminescence and have established a relationship between InAs(111)A surface smoothness and light emission intensity. This work paves the way for integrating the 6.1 A family of materials with the desirable properties of semiconductors with a (111) orientation. In addition, we will present preliminary results demonstrating the self-assembly of InGaAs quantum dots on these smooth InAs(111) surfaces, strongly indicating new paths towards ultra-low bandgap tunable light emitters for infrared optoelectronics.

*We acknowledge the support of the College of Engineering at Boise State University.

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Presenters

  • Kevin Vallejo

    • Micron School of Materials Science and Engineering, Boise State University

Authors

  • Kevin Vallejo

    • Micron School of Materials Science and Engineering, Boise State University

  • Trent Alan Garrett

    • Micron School of Materials Science and Engineering, Boise State University

  • Kevin Saythavy

    • Micron School of Materials Science and Engineering, Boise State University

  • Kathryn Sautter

    • Micron School of Materials Science and Engineering, Boise State University

  • Baolai Liang

    • California NanoSystems Institute, UCLA

  • Paul J Simmonds

    • Micron School of Materials Science and Engineering, Boise State University