Growth and characterization of Si/SiGe heterostructures towards scalable qubit architecture

POSTER

Abstract

Strained Si/SiGe Quantum Well (QW) structures are a promising material system for the realization of spin qubits based on spatially confined electrons. A major advantage for Si-based structures is their compatibility with mature Si-CMOS technology, providing high scalability. In this study we show a first step towards determining the relationship between the material properties (e.g. interface roughness and defect density) and qubit performance of these structures. In order to discuss the influence of the material properties of the QW, tensile strained Si QW embedded in Si0.7 Ge0.3 layers with different types of SiGe buffer layers are fabricated on 200 mm Si substrates. The material properties are characterized by various methods (X-Ray Diffraction, Secondary Ion Mass Spectrometry, Scanning Transmission Electron Microscopy).

*The "SiGeQuant (High-definition crystalline Silicon-Germanium structures for Quantum Circuits)" project is supported by the Leibniz-Gemeinschaft (Senatsausschuss Wettbewerb, SAW) under the project number K124/2018.

Presenters

  • Cedric Corley

    • Materials Research, IHP – Leibniz-Institut für innovative Mikroelektronik

Authors

  • Cedric Corley

    • Materials Research, IHP – Leibniz-Institut für innovative Mikroelektronik

  • Yuji Yamamoto

    • Technology, IHP – Leibniz-Institut für innovative Mikroelektronik

  • Markus Andreas Schubert

    • Technology, IHP – Leibniz-Institut für innovative Mikroelektronik

  • Florian Bärwolf

    • Technology, IHP – Leibniz-Institut für innovative Mikroelektronik

  • Marvin Zöllner

    • Materials Research, IHP – Leibniz-Institut für innovative Mikroelektronik

  • Inga Seidler

    • JARA-Institute for Quantum Information, RWTH Aachen University, D-52074 Aachen, Germany
    • JARA-FIT Institute for Quantum Information, RWTH Aachen University

  • Malte Neul

    • JARA-FIT Institute for Quantum Information, RWTH Aachen University

  • Lars Schreiber

    • JARA-Institute for Quantum Information, RWTH Aachen University, D-52074 Aachen, Germany
    • JARA-FIT Institute for Quantum Information, RWTH Aachen University

  • Giovanni Capellini

    • Materials Research, IHP – Leibniz-Institut für innovative Mikroelektronik

  • Wolfgang Matthias Klesse

    • Materials Research, IHP – Leibniz-Institut für innovative Mikroelektronik