Reduction of Stress in Dual Ion Beam Sputtered Ta<sub>2</sub>O<sub>5</sub> and SiO<sub>2</sub> Optical Interference Coatings

ORAL

Abstract

We studied the mechanical and optical properties of tantalum pentoxide (Ta2O5) and silicon dioxide (SiO2) films prepared by dual ion beam sputtering with the goal to realize thin films with a stress below 0.3 GPa. It is shown that the use of a low energy assist beam consisting of oxygen and argon species results in a Ta2O5 film with a stress below 100 MPa and a SiO2 film with a stress below 250 MPa. Using photothermal common path interferometry (PCI), spectrophotometry, and ellipsometry, it is shown that these films are suitable for use in interference coatings.

*DoD HEL JTO and ONR grant No. N00014-17-1-2536

–

Presenters

  • Emmett Randel

    • Colorado State Univ

Authors

  • Emmett Randel

    • Colorado State Univ

  • Aaron Davenport

    • Colorado State Univ

  • Carmen Susana Menoni

    • Colorado State Univ
    • Department of Electrical and Computer Engineering and NSF ERC for Extreme Ultraviolet Science and Technology, Colorado State University, Fort Collins, CO, USA
    • Department of Electrical and Computer Engineering, Colorado State University