Ion Implantation Leading to Magnetism in Many-Layer Graphene

ORAL

Abstract

P-orbital magnetism observed in graphene is of interest both to fundamental physics and for its potential application in new classes of spintronic devices. In this talk, we will demonstrate how low energy ion bombardment of graphene with hydrogen can be used to manipulate defect type and concentration to induce room temperature ferromagnetism in layered graphene. SQUID magnetometry measurements show that it is possible to control the magnetic properties by varying the H energy and dose. In-situ x-ray diffraction shows that ion distribution leads to layer expansion and an increase in RMS height variations of the graphene layers. Neutron reflectivity reveals that implanted H ions remain in the sample after dosing via chemisorption. The relationship between these results and magnetometry measurements, which show that ion implantation leads to a ferromagnetic moment at room temperature, will be discussed.

*NSF grant no. DGE-1069091, DOE SCGSR, ORNL GO! Programs

Presenters

  • Alessandro Mazza

    • Physics, University of Missouri

Authors

  • Alessandro Mazza

    • Physics, University of Missouri
  • Anna L Miettinen

    • Physics, Georgia Institute of Technology
  • Timothy Charlton

    • Spallation Neutron Source, Oak Ridge National Lab
    • Oak Ridge National Laboratory
  • Thomas Ward

    • Oak Ridge National Laboratory
    • Materials Science and Technology, Oak Ridge National Lab
  • Xiaoqing He

    • Department of Mechanical and Aerospace Engineering and Electron Microscopy Core, University of Missouri
    • University of Missouri
  • Alex A Daykin

    • Physics, University of Missouri
  • Suchismita Guha

    • Physics, University of Missouri
  • Guang Bian

    • Physics, University of Missouri
    • University of Missouri
    • Physics, U. of Missouri
  • Edward H. Conrad

    • Physics, Georgia Institute of Technology
  • Paul F Miceli

    • Physics, University of Missouri