Effect of CoFe Dusting Layer and Annealing on the Magnetic Properties of Sputtered Ta/W/CoFeB/CoFe/MgO Layer Structures

ORAL

Abstract

Ultrathin CoFeB films are an essential building block of most emerging spintronic applications due to the tunable perpendicular magnetic anisotropy (PMA) energy, low Gilbert damping and high annealing stability. Improvements in these magnetic properties are being explored through interface engineering. We explored the effect of a CoFe wedge inserted as a dusting layer (0.1 nm – 0.3 nm thick) at the CoFeB/MgO interface of a sputtered Ta(2 nm)/W(3 nm)/CoFeB(0.9 nm)/MgO(3 nm) film – a typical structure for spin-orbit torque devices. Films were annealed in a Rapid Thermal Annealer (RTA) at temperatures varying between 300 °C and 400 °C in an Ar environment. Ferromagnetic resonance studies were carried out to estimate the effective PMA field and the Gilbert damping as a function of the CoFe thickness and across several annealing temperatures. While as-deposited films present only easy-plane anisotropy, a transition along the wedge from easy-plane to out-of-plane was observed across several annealing temperatures. Interlaying a CoFe dusting film between CoFeB and MgO provides an alternative approach for PMA in ultrathin films.

*Supported by NSF grant ECCS-1609303

Presenters

  • Justine Drobitch

    • Electrical and Computer Engineering, Virginia Commonwealth University

Authors

  • Justine Drobitch

    • Electrical and Computer Engineering, Virginia Commonwealth University
  • Yu-Ching Hsiao

    • Electrical and Computer Engineering, University of California, Los Angeles
  • Hao Wu

    • Electrical and Computer Engineering, University of California, Los Angeles
    • University of California, Los Angeles
    • Electrical and Computer Engineering Department, University of California, Los Angeles
  • Kang Wang

    • University of California, Los Angeles
    • Electrical and Computer Engineering, University of California, Los Angeles
    • Department of Electrical Engineering, University of California, Los Angeles
  • Christopher S Lynch

    • College of Engineering, University of California at Riverside
  • Supriyo Bandyopadhyay

    • Electrical and Computer Engineeering, Virginia Commonwealth University
    • Electrical and Computer Engineering, Virginia Commonwealth University
  • Daniel B Gopman

    • Materials Science and Engineering Division, National Institute of Standards and Technology