Selective spin-on deposition of polymers on heterogeneous surfaces

Traditional photolithography relies on the manipulation of spun cast polymer films using a complex sequence of processing steps to generate patterns for device fabrication.¹ Selective deposition holds promise to reduce this economic burden and enable self-aligned fabrication by directly coating material only on desired regions of a heterogeneous surface.² Our work introduces a strategy to achieve selective polymer deposition via spin coating without necessitating superfluous processing steps (e.g., thermal annealing, etching). This talk will focus on understanding the interplay between polymer design, spin coating conditions, and consequent thin film characteristics.

1. Sanders, Chem. Rev. 2010, 110 (1), 321-360
2. Hashemi, et al. J. Phys. Chem. C 2014, 118 (20), 10957-10962