Process Monitoring to Improve Reliability and Yield for Superconducting Circuits
ORAL
Abstract
As the scale and complexity of superconducting circuits increases, characterizing and monitoring the underlying processes will become increasingly important. MIT Lincoln Laboratory uses process control structures to characterize devices, track key parameters, and support the development of more complex designs. We will describe the development of software and database capabilities that allow us to visualize cross-wafer patterns, examine trends, and monitor process stability.
*This research was funded by the Office of the Director of National Intelligence (ODNI), Intelligence Advanced Research Projects Activity (IARPA) via MIT Lincoln Laboratory under Air Force Contract No. FA8721-05-C-0002. The views and conclusions contained herein are those of the authors and should not be
–
Presenters
Alexandra Day
MIT Lincoln Laboratory
Massachusetts Inst of Tech-MIT
Authors
Alexandra Day
MIT Lincoln Laboratory
Massachusetts Inst of Tech-MIT
Danna Rosenberg
MIT Lincoln Laboratory
MIT Lincoln Lab
Massachusetts Inst of Tech-MIT
Lincoln Laboratory, Massachusetts Inst of Tech-MIT
David Kim
MIT Lincoln Laboratory
MIT Lincoln Lab
Lincoln Laboratory, Massachusetts Institute of Technology
Massachusetts Inst of Tech-MIT
Lincoln Laboratory, Massachusetts Inst of Tech-MIT
Jonilyn Yoder
MIT Lincoln Laboratory
MIT Lincoln Lab
Lincoln Laboratory, Massachusetts Institute of Technology
Massachusetts Inst of Tech-MIT
Lincoln Laboratory, Massachusetts Inst of Tech-MIT
William Oliver
MIT Lincoln Laboratory
MIT Lincoln Lab
Massachusetts Institute of Technology & MIT Lincoln Laboratory
Department of Physics, Research Laboratory of Electronics, Lincoln Laboratory, Massachusetts Institute of Technology
Massachusetts Inst of Tech-MIT
Department of Physics, Research Laboratory of Electronics, Lincoln Laboratory, Massachusetts Inst of Tech-MIT
MIT
Lincoln Laboratory, Research Laboratory of Electronics, and Department of Physics, Massachusetts Institute of Technology
Department of Physics, Research Laboratory of Electronics, Lincoln Laboratory, Massachusetts institute of Technology