A Versatile UHV Molecular Beam Epitaxy for High-purity Thin Film Growth

ORAL

Abstract

Molecular beam epitaxy (MBE) has long been at the forefront of high quality thin film growth. Here we describe the design and construction of a universal MBE system with the capability of thin film growth on various sample holders that are currently used in experimental set ups such as angle-resolved photoemission spectroscopy (ARPES), electron energy loss spectroscopy (EELS) and scanning tunneling microscopy (STM). The MBE has seven effusion cells (High-T, low-T and standard) and electron beam evaporators for evaporating a host of different materials (Ti, Se, Bi, Sb, Mo, Nb etc). This universal MBE system uses a sample holder-holder to accommodate different sample holders. After deposition, the sample holder-holder can be unloaded via a vacuum shuttle for in-situ transfer to the respective systems. We will describe the growth and characterization of dichalcogenides on a variety of substrates using this MBE system.

*Gordon and Betty Moore foundation (Grant GBMF4860)

Presenters

  • Somesh Ganguli

    • Physics, Univ of Illinois - Urbana

Authors

  • Somesh Ganguli

    • Physics, Univ of Illinois - Urbana
  • Guannan Chen

    • Physics, Univ of Illinois - Urbana
  • Waclaw Swiech

    • Physics, Univ of Illinois - Urbana
  • Vidya Madhavan

    • Physics, Univ of Illinois - Urbana
    • Physics, Univ of Illinois
    • University of Illinois - Urbana Champaign
    • Physics, University of Illinois
    • University of Illinois at Urbana-Champaign
    • Physics, Univeristy of Illinois at Urbana-Champaign
    • Univ of Illinois - Urbana
    • Department of Physics, University of Illinois
    • Department of Physics, Univ of Illinois - Urbana-Champaign