Quantitative Analysis of Surface Losses in Coplanar Waveguide Resonators, Part 1: Materials and Fabrication

ORAL

Abstract

Two-level systems (TLS) at metal-substrate, metal-air, and substrate-air interfaces are a significant contributor to loss in superconducting resonators probed at the single-photon limit. The choice of fabrication methods for different combinations of superconducting material and substrate affects the TLS density at these interfaces. In this talk, we discuss the process development of high quality factor resonators (Qi >1M) for aluminum, titanium nitride, and niobium, and how both anisotropic and isotropic etching facilitates device geometries designed to focus TLS participation on specific interfaces. Material-specific fabrication challenges are addressed to enable a comparison of surface losses between materials or for a specific fabrication process. Lastly, we report progress on applying this understanding to superconducting qubit devices.

*This material is based upon work supported by the Department of Defense under Air Force Contract No. FA8721-05-C-0002 and/or FA8702-15-D-0001.

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Presenters

  • Alexander Melville

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab
    • Massachusetts Inst of Tech-MIT

Authors

  • Alexander Melville

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab
    • Massachusetts Inst of Tech-MIT

  • Philip Krantz

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab
    • Massachusetts Inst of Tech-MIT
    • MIT

  • Wayne Woods

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab
    • Massachusetts Inst of Tech-MIT

  • Rabindra Das

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab
    • Massachusetts Inst of Tech-MIT

  • Evan Golden

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab
    • Massachusetts Inst of Tech-MIT

  • Corey Stull

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab
    • Massachusetts Inst of Tech-MIT

  • Vlad Bolkhovsky

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab

  • Danielle Braje

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab

  • David Hover

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab

  • David Kim

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab
    • Lincoln Laboratory, Massachusetts Institute of Technology
    • Massachusetts Inst of Tech-MIT
    • Lincoln Laboratory, Massachusetts Inst of Tech-MIT

  • Xhovalin Miloshi

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab

  • Danna Rosenberg

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab
    • Massachusetts Inst of Tech-MIT
    • Lincoln Laboratory, Massachusetts Inst of Tech-MIT

  • Arjan Sevi

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab

  • Jonilyn Yoder

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab
    • Lincoln Laboratory, Massachusetts Institute of Technology
    • Massachusetts Inst of Tech-MIT
    • Lincoln Laboratory, Massachusetts Inst of Tech-MIT

  • Eric Dauler

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab

  • William Oliver

    • MIT Lincoln Laboratory
    • MIT Lincoln Lab
    • Massachusetts Institute of Technology & MIT Lincoln Laboratory
    • Department of Physics, Research Laboratory of Electronics, Lincoln Laboratory, Massachusetts Institute of Technology
    • Massachusetts Inst of Tech-MIT
    • Department of Physics, Research Laboratory of Electronics, Lincoln Laboratory, Massachusetts Inst of Tech-MIT
    • MIT
    • Lincoln Laboratory, Research Laboratory of Electronics, and Department of Physics, Massachusetts Institute of Technology
    • Department of Physics, Research Laboratory of Electronics, Lincoln Laboratory, Massachusetts institute of Technology