Development of a Portable Conductive AFM Lithography Workstation
ORAL
Abstract
Conductive Atomic Force Microscope (c-AFM) Lithography provides the tools needed to create devices from the two-dimensional electron system that lies at the LaAlO3/SrTiO3 (LAO/STO) interface. By using c-AFM lithography, we can create devices such as electron waveguides and single electron transistors that allow us to observe properties of LAO/STO that are only found using those devices. Due to the decaying nature of these devices in the ambient environment, even sealing the devices in a portable vacuum chamber can not ensure the survival of the previously written devices. This causes the transportation of such devices made using c-AFM lithography difficult. To provide a solution to this pressing issue, we decided to create a portable lithography workstation by combining a portable AFM with a transport measurement setup, and as such enabling us to perform lithography at any location.
*We acknowledge support from the Vannevar Bush Faculty Fellowship program sponsored by the Basic Research Office of the Assistant Secretary of Defense for Research and Engineering and funded by the Office of Naval Research through grant N00014-15-1-2847.
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Presenters
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Joseph Albro
- Physics, Univ of Pittsburgh