Reconfigurable Diodes Based on Vertical WSe<sub>2</sub> Transistors with van der Waals Bonded Contacts

ORAL

Abstract

New device concepts can increase the functionality of scaled electronic devices, with reconfigurable diodes allowing the design of more compact logic gates being one of the examples. In recent years, there has been significant interest in creating reconfigurable diodes based on ultra-thin transition metal dichalcogenide crystals. Thanks to their large surface areas, these devices were constructed under planar geometry and device characteristics are controlled by electrostatic gating through rather complex two independent local gates or ionic-liquid doping process. In this talk, we demonstrate similar reconfigurable diode actions in a WSe2 transistor by only utilizing van der Waals bonded graphene and Co/ h-BN contacts. Towards this, we first characterize the charge injection efficiencies into WSe2 by graphene and Co/h-BN contacts. While Co/h-BN contact results in nearly Schottky barrier-free charge injection, graphene/WSe2 interface has an average barrier height of ~ 80 meV. By taking the advantage of the electrostatic transparency of graphene and the different work-function values of graphene and Co/h-BN, we construct vertical devices where we demonstrate different gate-tunable diode actions. Our device architecture reveals the opportunities for exploring new device concepts.

Presenters

  • Dmitrii Unuchek

    • EPFL
    • Ecole polytechnique fédérale de Lausanne

Authors

  • Ahmet Avsar

    • EPFL
    • École Polytechnique Federale de Lausanne
  • Dmitrii Unuchek

    • EPFL
    • Ecole polytechnique fédérale de Lausanne
  • Kolyo Marinov

    • Electrical Engineering Institute, Ecole Polytechnique Federale de Lausanne
    • EPFL
  • Enrique Gonzalez Marin

    • Universita di Pisa
  • Giuseppe Iannaccone

    • Universita di Pisa
  • Kenji Watanabe

    • National Institute for Materials Science
    • NIMS
    • National Institute for Material Science
    • Advanced Materials Laboratory, National Institute for Materials Science
    • National Institute of Materials Science
    • Research Center for Functional Materials, National Institute for Materials Science
    • National Institute for Materials Science (NIMS
    • Advanced Materials Laboratory, NIMS
    • National Institute for Materials Science, Advanced Materials Laboratory
    • National Institue for Materials Science
    • National Institute of Material Science
    • National Institute for Matericals Science
    • Advanced Materials Laboratory
    • National Institute for Materials Science, 1-1 Namiki
    • Advanced materials laboratory, National institute for Materials Science
    • NIMS-Japan
  • Takashi Taniguchi

    • National Institute for Materials Science
    • NIMS
    • National Institute for Material Science
    • Advanced Materials Laboratory, National Institute for Materials Science
    • National Institute of Materials Science
    • Research Center for Functional Materials, National Institute for Materials Science
    • National Institute for Materials Science (NIMS
    • Advanced Materials Laboratory, NIMS
    • National Institute for Materials Science, Advanced Materials Laboratory
    • National Institue for Materials Science
    • National Institute of Material Science
    • National Institute for Matericals Science
    • Advanced Materials Laboratory
    • National Institute for Materials Science, 1-1 Namiki
    • NIMS-Japan
  • Gianluca Fiori

    • Universita di Pisa
  • Andras Kis

    • Electrical Engineering Institute, Ecole Polytechnique Federale de Lausanne
    • EPFL
    • Ecole polytechnique fédérale de Lausanne