Imaging Bulk and Edge Transport near the Dirac Point in Graphene Moiré Superlattices

ORAL

Abstract

Van der Waals structures formed by aligning graphene monolayers with hexagonal boron nitride exhibit a moiré superlattice and broken sublattice symmetry that opens a gap at the Dirac point. The electrical conductivity is thermally activated at high temperature and saturates at low temperature indicating the existence of subgap states [1]. Transport via such states both in the bulk [2] and at the edges [3] have been suggested. We present a scanning gate microscopy study of moiré superlattice devices with similar gap size but different charge disorder. In the device with high charge impurity (~1010 cm-2) and low saturated resistivity (~10 kΩ) at the Dirac point we observe a clear response at the edges. Combined with simulations, we interpret the response as a result of enhanced edge doping. In addition, a device with low charge impurity (~109 cm-2) and high resistivity (~100 kΩ) shows bulk response only, consistent with the absence of edge-state shunting [3]. Our results provide microscopic insight into edge conduction that can be helpful in understanding transport in gapped Dirac systems. [1] Hunt et al. Science. 21, 1427-1430 (2013) [2] Gorbachev et al. Science. 24, 448-451 (2014) [3] Zhu et al. Nat. Commun. 8, 14552 (2017)

*EPSRC, JST CREST, and JSPS KAKENHI

Presenters

  • Ziwei Dou

    • Department of Physics, University of Cambridge
    • Univ of Cambridge

Authors

  • Ziwei Dou

    • Department of Physics, University of Cambridge
    • Univ of Cambridge
  • Sei Morikawa

    • Univ of Tokyo
    • Univ. of Tokyo
  • Alessandro Cresti

    • Univ. Grenoble Alpes, CNRS, Grenoble INP, IMEP-LaHC
  • Shu-Wei Wang

    • Department of Physics, University of Cambridge
    • Univ of Cambridge
  • Charles Smith

    • Department of Physics, Cavendish Laboratory, University of Cambridge, JJ Thomson Avenue
    • Department of Physics, University of Cambridge
    • Univ of Cambridge
  • Christos Melios

    • National Physical Laboratory
  • Olga Kazakova

    • National Physical Laboratory
  • Kenji Watanabe

    • National Institute for Materials Science
    • NIMS
    • National Institute for Material Science
    • Advanced Materials Laboratory, National Institute for Materials Science
    • National Institute of Materials Science
    • Research Center for Functional Materials, National Institute for Materials Science
    • National Institute for Materials Science (NIMS
    • Advanced Materials Laboratory, NIMS
    • National Institute for Materials Science, Advanced Materials Laboratory
    • National Institue for Materials Science
    • National Institute of Material Science
    • National Institute for Matericals Science
    • Advanced Materials Laboratory
    • National Institute for Materials Science, 1-1 Namiki
    • Advanced materials laboratory, National institute for Materials Science
    • NIMS-Japan
  • Takashi Taniguchi

    • National Institute for Materials Science
    • NIMS
    • National Institute for Material Science
    • Advanced Materials Laboratory, National Institute for Materials Science
    • National Institute of Materials Science
    • Research Center for Functional Materials, National Institute for Materials Science
    • National Institute for Materials Science (NIMS
    • Advanced Materials Laboratory, NIMS
    • National Institute for Materials Science, Advanced Materials Laboratory
    • National Institue for Materials Science
    • National Institute of Material Science
    • National Institute for Matericals Science
    • Advanced Materials Laboratory
    • National Institute for Materials Science, 1-1 Namiki
    • NIMS-Japan
  • Satoru Masubuchi

    • Univ of Tokyo
    • Univ. of Tokyo
  • Tomoki Machida

    • Univ of Tokyo
    • Univ. of Tokyo
  • Malcolm Connolly

    • Department of Physics, Cavendish Laboratory, University of Cambridge, JJ Thomson Avenue
    • Department of Physics, University of Cambridge
    • Univ of Cambridge
    • Niels Bohr Institute, Univ of Copenhagen