Characterization of shadow evaporated Al/AlOx/Al Josephson Junctions

Building a large-scale quantum computer depends crucially on developing a Josephson junction fabrication process that is reliable. We have collected and analyzed data for more than $10^5$ junctions, measured using an automated DC probe station at room temperature. Using this method, we can identify and monitor the impact of subtle process parameters on junction performance resulting from aging, pressure, lithography and surface treatment. We also present transmission electron microscopy and electron energy loss spectroscopy of our junctions.