Thin Film Stability of Polystyrene with a Functional End Group

The thin film stability of omega-$N$-(3-(dimethylamino)propyl)propylamide-terminated polystyrene (PS-N) and its mixture with conventional polystyrene (PS-H) spin-coated on silicon wafers with a native oxide layer was studied. While a 20 nm-thick film of PS-H with a number-average molecular weight of approximately 50k was broken at 423 K, a comparable PS-N film and blend films with a PS-N fraction higher than 40 wt{\%} were stable. Although the local conformation of chains at the substrate interface was not the same for PS with/without the functionalized terminal group, the glass transition temperature at the interface was identical for PS-H and PS-N. The residual adsorbed layer on the substrate after washing the films with toluene was thicker for PS-N than for PS-H. This implies that the end functionalization impacts chain movement on a large scale rather than via segmental dynamics.