Interlayer Exciton Optoelectronics in a 2D Heterostructure p-n Junction

ORAL

Abstract

Semiconductor heterostructures are backbones for solid state based optoelectronic devices, which are now being engineered at the atomically thin limit using 2D semiconductors heterojunctions. In monolayer WSe$_{\mathrm{2}}$-MoSe$_{\mathrm{2}}$ heterobilayers, the type II band alignment causes the formation of interlayer excitons -- with electron and hole confined to different layers -- which have shown promising properties for novel excitonic devices. Here, we demonstrate interlayer exciton optoelectronics in an electrostatically defined p-n junction, which uses tunneling contacts to preferentially inject electrons and holes directly into the n and p type monolayers of the heterobilayer. Wavelength dependent photocurrent measurements provide the first direct observation of resonant optical excitation of the interlayer exciton, which allows estimation of its oscillator strength compared to that of intralayer excitons. Furthermore, comparison of the photocurrent, electroluminescence, and photoluminescence spectra provides evidence for the predicted finite center of velocity light cones in the interlayer exciton dispersion.

Authors

  • Pasqual Rivera

    • Univ of Washington
    • University of Washington
  • Jason Ross

    • University of Washington
  • John Schaibley

    • University of Washington
  • Eric Lee-Wong

    • University of Washington
  • Hongyi Yu

    • University of Hong Kong
  • Takashi Taniguchi

    • National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki, 305-0044 JAPAN
    • National Institute for Material Science, Japan
    • National Institute for Materials Science
    • National Institute for Materials Science, Japan
    • Advanced materials laboratory, National institute for Materials Science, Tsukuba, Ibaraki, 305-0044, Japan
    • NIMS, Tsukuba, Japan
  • Kenji Watanabe

    • National Institute for Materials Science, 1-1 Namiki, Tsukuba, Ibaraki, 305-0044 JAPAN
    • National Institute for Material Science, Japan
    • National Institute for Materials Science
    • National Institute for Materials Science, Japan
    • Advanced materials laboratory, National institute for Materials Science, Tsukuba, Ibaraki, 305-0044, Japan
    • NIMS, Tsukuba, Japan
  • Jiaqiang Yan

    • Oak Ridge National Laboratory \& University of Tennessee
  • David Mandrus

    • The University of Tennessee, Knoxville
    • Department of Materials Science and Engineering, University of Tennessee, Knoxville, Knoxville, Tennessee 37996, USA
    • Oak Ridge National Laboratory \& University of Tennessee
    • University of Tennessee, Knoxville
    • Department of Materials Science and Engineering, University of Tennessee
  • David Cobden

    • Department of Physics, University of Washington
    • Department of Physics, University of Washington, Seattle, WA 98195, USA
    • Univ of Washington
    • University of Washington
  • Wang Yao

    • University of Hong Kong
    • University of Hong Kong, Hong Kong, China
  • Xiaodong Xu

    • University of Wasington
    • University of Washington
    • Univ of Washington
    • Department of Physics, University of Washington
    • University of Washington, Seattle, USA.