First-Principles Modeling of Excited-State Phenomena II: Computational Advances

FOCUS · F7 ·

Presentations

  • ORAL

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    Authors

    • Peitao Liu

      • University of Vienna, Faculty of Physics and Center for Computational Materials Science, Sensengasse 8/12, A-1090 Vienna, Austria
      • Faculty of Physics and Center for Computational Materials Science, Sensengasse 8/12, A-1090 Vienna, Austria

    • Merzuk Kaltak

      • University of Vienna, Faculty of Physics and Center for Computational Materials Science, Sensengasse 8/12, A-1090 Vienna, Austria

    • Ji\v{r}\'{\i} Klime\v{s}

      • J. Heyrovsk\'{y} Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, Dolej\v{s}kova 3, CZ-18223 Prague 8, Czech Republic

    • Georg Kresse

      • University of Vienna, Faculty of Physics and Center for Computational Materials Science, Sensengasse 8/12, A-1090 Vienna, Austria

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  • ORAL

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    Authors

    • Weiyi Xia

      • State Univ of NY - Buffalo

    • Weiwei Gao

      • State Univ of NY - Buffalo

    • Yabei Wu

      • Shanghai University and State Univ of NY - Buffalo
      • State Univ of NY - Buffalo

    • Peihong Zhang

      • SUNY Buffalo
      • Shanghai University and State Univ of NY - Buffalo
      • State Univ of NY - Buffalo

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  • ORAL

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    Authors

    • Ikutaro Hamada

      • National Institute for Materials Science

    • Marco Govoni

      • Institute for Molecular Engineering, University of Chicago; Materials Science Division, Argonne National Laboratory
      • Argonne National Laboratory and University of Chicago
      • Materials Science Division, Argonne National Laboratory and Institute for Molecular Engineering, University of Chicago and
      • University of Chicago and Argonne National Laboratory

    • Giulia Galli

      • Univ of Chicago and Argonne National Laboratory
      • Univ of Chicago
      • University of Chicago; Argonne National Laboratory
      • Institute for Molecular Engineering, University of Chicago; Argonne National Laboratory
      • Institute for Molecular Engineering, University of Chicago and Materials Science Division, Argonne Natl Lab
      • Institute for Molecular Engineering, University of Chicago; Materials Science Division, Argonne National Laboratory
      • Institute for Molecular Engineering, University of Chicago, Chicago, IL 60637 and Materials Science Division, Argonne National Laboratory, Lemont, IL
      • Institute for Molecular Engineering, University of Chicago and Argonne Natl Lab
      • University of Chicago, Chicago, IL 60637, USA
      • The University of Chicago, Institute for Molecular Engineering and Argonne National Laboratory
      • Argonne National Laboratory and University of Chicago
      • Institute for Molecular Engineering, University of Chicago and Materials Science Division, Argonne National Laboratory
      • University of Chicago
      • The University of Chicago
      • University of Chicago and Argonne National Laboratory

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  • ORAL

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    Authors

    • Marco Govoni

      • Institute for Molecular Engineering, University of Chicago; Materials Science Division, Argonne National Laboratory
      • Argonne National Laboratory and University of Chicago
      • Materials Science Division, Argonne National Laboratory and Institute for Molecular Engineering, University of Chicago and
      • University of Chicago and Argonne National Laboratory

    • Giulia Galli

      • Univ of Chicago and Argonne National Laboratory
      • Univ of Chicago
      • University of Chicago; Argonne National Laboratory
      • Institute for Molecular Engineering, University of Chicago; Argonne National Laboratory
      • Institute for Molecular Engineering, University of Chicago and Materials Science Division, Argonne Natl Lab
      • Institute for Molecular Engineering, University of Chicago; Materials Science Division, Argonne National Laboratory
      • Institute for Molecular Engineering, University of Chicago, Chicago, IL 60637 and Materials Science Division, Argonne National Laboratory, Lemont, IL
      • Institute for Molecular Engineering, University of Chicago and Argonne Natl Lab
      • University of Chicago, Chicago, IL 60637, USA
      • The University of Chicago, Institute for Molecular Engineering and Argonne National Laboratory
      • Argonne National Laboratory and University of Chicago
      • Institute for Molecular Engineering, University of Chicago and Materials Science Division, Argonne National Laboratory
      • University of Chicago
      • The University of Chicago
      • University of Chicago and Argonne National Laboratory

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  • ORAL

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    Authors

    • Meng Wu

      • Physics Department, UC Berkeley and Lawrence Berkeley National Lab

    • Steven G. Louie

      • Department of Physics, UC Berkeley and Lawrence Berkeley National Lab
      • UC Berkeley and Lawrence Berkeley National Lab
      • University of California at Berkeley and Lawrence Berkeley National Lab
      • Physics Department, UC Berkeley and Lawrence Berkeley National Lab
      • Department of Physics, University of California at Berkeley and Materials Sciences Division, Lawrence Berkeley National Laboratory
      • Univ of California - Berkeley and Lawrence Berkeley National Lab

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  • ORAL

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    Authors

    • Mauro Del Ben

      • Lawrence Berkeley National Laboratory

    • Felipe H. da Jornada

      • University of California at Berkeley and Lawrence Berkeley National Laboratory

    • Jack Deslippe

      • NERSC, Lawrence Berkeley National Laboratory

    • Steven G. Louie

      • University of California at Berkeley and Lawrence Berkeley National Laboratory

    • Andrew Canning

      • Lawrence Berkeley National Laboratory

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