Optical fingerprints of solid-liquid interfaces: a joint ATR-IR and \emph{first principles} investigation
ORAL
Abstract
Despite the importance of understanding the structural and bonding properties of solid-liquid interfaces for a wide range of (photo-)electrochemical applications, there are presently no experimental techniques available to directly probe the microscopic structure of solid-liquid interfaces. To develop robust strategies to interpret experiments and validate theory, we carried out attenuated total internal reflection (ATR-IR) spectroscopy measurements and \emph{ab initio} molecular dynamics (AIMD) simulations of the vibrational properties of interfaces between liquid water and well-controlled prototypical semiconductor substrates. We show the Ge(100)/H$_2$O interface to feature a reversible potential-dependent surface phase transition between Ge-H and Ge-OH termination. The Si(100)/H$_2$O interface is proposed as a model system for corrosion and oxidation processes. We performed AIMD calculations under finite electric fields, revealing different pathways for initial oxidation. These pathways are predicted to exhibit unique spectral signatures. A significant increase in surface specificity can be achieved utilizing an angle-dependent ATR-IR experiment, which allows to detect such signatures at the interfacial layer and consequently changes in the hydrogen bond network.
*Funding from DOE-BES Grant No. DE-SS0008939 and the Deutsche Forschungsgemeinschaft (RESOLV, EXC 1069) are gratefully acknowledged.
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Authors
L. Yang
Max-Planck-Inst f\"ur Eisenforschung
F. Niu
Max-Planck-Inst f\"ur Eisenforschung
S. Tecklenburg
Max-Planck-Inst f\"ur Eisenforschung
M. Pander
Max-Planck-Inst f\"ur Eisenforschung
S. Nayak
Max-Planck-Inst f\"ur Eisenforschung
A. Erbe
Max-Planck-Inst f\"ur Eisenforschung
Stefan Wippermann
Max Planck Inst fuer Eisenforschung GmbH
Max-Planck-Inst f\"ur Eisenforschung
Francois Gygi
Department of Computer Science, University of California Davis, Davis, CA 95616
University of California, Davis, CA 95616, USA
University of California, Davis
University of California Davis
Giulia Galli
Univ of Chicago and Argonne National Laboratory
Univ of Chicago
University of Chicago; Argonne National Laboratory
Institute for Molecular Engineering, University of Chicago; Argonne National Laboratory
Institute for Molecular Engineering, University of Chicago and Materials Science Division, Argonne Natl Lab
Institute for Molecular Engineering, University of Chicago; Materials Science Division, Argonne National Laboratory
Institute for Molecular Engineering, University of Chicago, Chicago, IL 60637 and Materials Science Division, Argonne National Laboratory, Lemont, IL
Institute for Molecular Engineering, University of Chicago and Argonne Natl Lab
University of Chicago, Chicago, IL 60637, USA
The University of Chicago, Institute for Molecular Engineering and Argonne National Laboratory
Argonne National Laboratory and University of Chicago
Institute for Molecular Engineering, University of Chicago and Materials Science Division, Argonne National Laboratory
University of Chicago
The University of Chicago
University of Chicago and Argonne National Laboratory