Dopants and Defects in Semiconductors I: Quantum Information

FOCUS · A28 ·






Presentations

  • ORAL

    Authors

    • Joseph Hagmann

      • The National Institute Of Standards And Technology
      • The National Institute of Standards and Technology
      • NIST - Natl Inst of Stds & Tech
    • Xiqiao Wang

      • NIST - Natl Inst of Stds & Tech
    • Pradeep Namboodiri

      • NIST - Natl Inst of Stds & Tech
    • Jonathan Wyrick

      • NIST - Natl Inst of Stds & Tech
    • Roy Murray

      • NIST - Natl Inst of Stds & Tech
    • M. D. Stewart

      • NIST - Natl Inst of Stds & Tech
    • Richard Silver

      • NIST - Natl Inst of Stds & Tech
    • Curt Richter

      • NIST - Natl Inst of Stds & Tech

    View abstract →

  • ORAL

    Authors

    • Peter Scherpelz

      • Institute for Molecular Engineering, University of Chicago
    • Giulia Galli

      • Univ of Chicago and Argonne National Laboratory
      • Univ of Chicago
      • University of Chicago; Argonne National Laboratory
      • Institute for Molecular Engineering, University of Chicago; Argonne National Laboratory
      • Institute for Molecular Engineering, University of Chicago and Materials Science Division, Argonne Natl Lab
      • Institute for Molecular Engineering, University of Chicago; Materials Science Division, Argonne National Laboratory
      • Institute for Molecular Engineering, University of Chicago, Chicago, IL 60637 and Materials Science Division, Argonne National Laboratory, Lemont, IL
      • Institute for Molecular Engineering, University of Chicago and Argonne Natl Lab
      • University of Chicago, Chicago, IL 60637, USA
      • The University of Chicago, Institute for Molecular Engineering and Argonne National Laboratory
      • Argonne National Laboratory and University of Chicago
      • Institute for Molecular Engineering, University of Chicago and Materials Science Division, Argonne National Laboratory
      • University of Chicago
      • The University of Chicago
      • University of Chicago and Argonne National Laboratory

    View abstract →

  • ORAL

    Authors

    • Daniel Sanchez-Portal

      • Centro de Fisica de Materiales
      • Centro de Fisica de Materiales CSIC-UPV/EHU and DIPC
    • Mads Engelund

      • Centro de Fisica de Materiales CSIC-UPV/EHU and DIPC
    • Thomas Frederiksen

      • DIPC and IKERBASQUE, Basque Foundation for Science, Bilbao, Spain
    • Szymon Godlewski

      • Centre for Nanometer-Scale Science and Advanced Materials (NANOSAM), Jagiellonian Univ., Krakow, Poland
    • Marek Kolmer

      • Centre for Nanometer-Scale Science and Advanced Materials (NANOSAM), Jagiellonian Univ., Krakow, Poland
    • Rafal Zuzak

      • Centre for Nanometer-Scale Science and Advanced Materials (NANOSAM), Jagiellonian Univ., Krakow, Poland
    • Bartosz Such

      • Centre for Nanometer-Scale Science and Advanced Materials (NANOSAM), Jagiellonian Univ., Krakow, Poland
    • Marek Szymonski

      • Centre for Nanometer-Scale Science and Advanced Materials (NANOSAM), Jagiellonian Univ., Krakow, Poland

    View abstract →

  • ORAL

    Authors

    • Zaili Peng

      • Department of Chemistry, University of Southern California
    • Viktor Stepanov

      • Department of Chemistry, University of Southern California
    • Susumu Takahashi

      • Department of Chemistry, University of Southern California; Department of Physics&Astronomy, University of Southern California

    View abstract →

  • ORAL

    Authors

    • Paolo Andrich

      • Institute for Molecular Engineering, University of Chicago
      • Institute for Molecular Engineering, University of Chicago, Chicago, IL 60637, USA
    • Charles F. de las Casas

      • Institute for Molecular Engineering, University of Chicago, Chicago, IL 60637, USA
    • Xiaoying Liu

      • Institute for Molecular Engineering, University of Chicago, Chicago, IL 60637, USA
    • Hope L. Bretscher

      • Institute for Molecular Engineering, University of Chicago, Chicago, IL 60637, USA
    • Paul F. Nealey

      • Institute for Molecular Engineering, University of Chicago, Chicago, IL 60637, USA
    • David D. Awschalom

      • Institute for Molecular Engineering, University of Chicago, Chicago, IL 60637, USA
    • F. Joseph Heremans

      • Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA

    View abstract →

  • ORAL

    Authors

    • K Ambal

      • Department of Physics and Astronomy, University of Utah, Salt Lake City, 84112, USA
    • C .C. Williams

      • Department of Physics and Astronomy, University of Utah, Salt Lake City, 84112, USA
    • C Boehme

      • Department of Physics and Astronomy, University of Utah, Salt Lake City, Utah 84112, USA
      • University of Utah
      • Department of Physics & Astronomy, University of Utah
      • Department of Physics and Astronomy, University of Utah, Salt Lake City, 84112, USA

    View abstract →

  • ORAL

    Authors

    • Annemarie Exarhos

      • University of Pennsylvania
    • David Hopper

      • University of Pennsylvania
    • Richard Grote

      • University of Pennsylvania
    • Jennifer Saouaf

      • University of Pennsylvania
    • Audrius Alkauskas

      • Center for Physical Sciences and Technology (FTMC), Lithuania
      • Center for Physical Sciences and Technology, Vilnius, Lithuania
      • Center for Physical Sciences and Technology Vilnius, Lithuania
      • Center for Physical Sciences and Technology
    • Lee Bassett

      • University of Pennsylvania

    View abstract →